SiO2/TiO2 thin films with variable refractive index prepared by ion beam induced and plasma enhanced chemical vapor deposition

被引：70
作者：
Gracia, F
Yubero, F
Holgado, JP
Espinos, JP
Gonzalez-Elipe, AR
Girardeau, T
机构：
[1] Univ Seville, Inst Ciencia Mat Sevilla, CSIC, Seville 41092, Spain
[2] Dept Q Inorgan, Seville 41092, Spain
[3] CNRS, Lab Met Phys Poitiers, UMR 6630, F-86962 Futuroscope, France
来源：
THIN SOLID FILMS | 2006年 / 500卷 / 1-2期
关键词：
x-ray absorption spectroscopy; ion beam assisted deposition; optical properties; SiO2/TiO2; films; fourier transform infrared spectroscopy (FT-IR);
D O I：
10.1016/j.tsf.2005.10.061
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
SiO2/TiO2 optical thin films with variable compositions have been prepared by ion beam induced and plasma enhanced chemical vapour deposition (IBICVD and PECVD). While the films obtained by IBICVD were very compact, the PECVD ones with a high content of Ti presented a columnar microstructure. The formation of Si-O-Ti bonds and a change in the environment around titanium from four- to six-coordinated has been proved by vibrational and X-ray absorption spectroscopies. The refractive index increased with the titanium content from 1.45 to 2.46 or 2.09 for, respectively, the IBICVD and PECVD films. Meanwhile, the band gap decreased, first sharply and then more smoothly up to the value of pure TiO2. It is concluded that the optical properties of SiO2/TiO2 thin films can be properly tailored by using these two procedures. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码：19 / 26
页数：8
相关论文
共 39 条
[1]   OPTICAL-PROPERTIES OF THIN-FILMS [J].
ASPNES, DE .
THIN SOLID FILMS, 1982, 89 (03) :249-262
[2]   Synthesis of SiO2 and SiOxCyHz thin films by microwave plasma CVD [J].
Barranco, A ;
Cotrino, J ;
Yubero, F ;
Espinós, JP ;
Benítez, J ;
Clerc, C ;
González-Elipe, AR .
THIN SOLID FILMS, 2001, 401 (1-2) :150-158
[3]   Characterisation of antireflective TiO2//SiO2 coatings by complementary techniques [J].
Battaglin, C ;
Caccavale, F ;
Menelle, A ;
Montecchi, M ;
Nichelatti, E ;
Nicoletti, F ;
Polato, P .
THIN SOLID FILMS, 1999, 351 (1-2) :176-179
[4]   Microstructural characterization of ion assisted SiO2 thin films by visible and infrared ellipsometry [J].
Brunet-Bruneau, A ;
Souche, D ;
Fisson, S ;
Van, VN ;
Vuye, G ;
Abeles, F ;
Rivory, J .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1998, 16 (04) :2281-2286
[5]   Infrared ellipsometric study of SiO2 films:: relationship between LO mode frequency and porosity [J].
Brunet-Bruneau, A ;
Fisson, S ;
Gallas, B ;
Vuye, G ;
Rivory, J .
THIN SOLID FILMS, 2000, 377 :57-61
[6]   ION-BEAM SPUTTERING OF (TA2O5)(X)-(SIO2)(1-X) COMPOSITE THIN-FILMS [J].
CEVRO, M .
THIN SOLID FILMS, 1995, 258 (1-2) :91-103
[7]   Mixed films of TiO2-SiO2 deposited by double electron-beam coevaporation [J].
Chen, JS ;
Chao, S ;
Kao, JS ;
Niu, H ;
Chen, CH .
APPLIED OPTICS, 1996, 35 (01) :90-96
[8]   L2,3 X-RAY-ABSORPTION EDGES OF D0 COMPOUNDS - K+, CA-2+, SC-3+ AND TI-4+ IN OH (OCTAHEDRAL) SYMMETRY [J].
DEGROOT, FMF ;
FUGGLE, JC ;
THOLE, BT ;
SAWATZKY, GA .
PHYSICAL REVIEW B, 1990, 41 (02) :928-937
[9]   2P X-RAY ABSORPTION OF 3D TRANSITION-METAL COMPOUNDS - AN ATOMIC MULTIPLET DESCRIPTION INCLUDING THE CRYSTAL-FIELD [J].
DEGROOT, FMF ;
FUGGLE, JC ;
THOLE, BT ;
SAWATZKY, GA .
PHYSICAL REVIEW B, 1990, 42 (09) :5459-5468
[10]   Toward perfect antireflection coatings: numerical investigation [J].
Dobrowolski, JA ;
Poitras, D ;
Ma, P ;
Vakil, H ;
Acree, M .
APPLIED OPTICS, 2002, 41 (16) :3075-3083
1234