Production of microwave plasma in narrow cross sectional tubes: Effect of the shape of cross section

被引：34
作者：
Bhattacharjee, S
Amemiya, H
机构：
[1] Inst Phys & Chem Res, Plasma Phys Lab, Wako, Saitama 3510198, Japan
[2] Saitama Univ, Grad Sch Sci & Engn, Urawa, Saitama 3388570, Japan
来源：
REVIEW OF SCIENTIFIC INSTRUMENTS | 1999年 / 70卷 / 08期
关键词：
D O I：
10.1063/1.1149914
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
A microwave plasma is produced in a conducting tube with a cross section smaller than the cutoff value. Waves of 2.45 GHz are launched perpendicularly to the multicusp magnetic field formed by permanent magnets surrounding the tube. Circular and square cross sectional tubes are tested. Overdense plasmas with a density of (0.8-2.0) x 10(11) cm(-3) are obtained in the range of 10(-4) Torr for powers of 200-360 W. The electron temperature is 6-12 eV. Under the same experimental conditions, the plasma density and the electron temperature are higher for the circular cross section. (C) 1999 American Institute of Physics. [S0034-6748(99)00308-1].
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收藏
页码：3332 / 3337
页数：6
相关论文
共 10 条
[1]  
ALLIS WP, 1963, WAVES ANISOTROPIC PL, P30
[2]   Multicusp type machine for electron cyclotron resonance plasma with reduced dimensions [J].
Amemiya, H ;
Maeda, M .
REVIEW OF SCIENTIFIC INSTRUMENTS, 1996, 67 (03) :769-774
[3]   ELECTRON-ENERGY DISTRIBUTION IN MULTICUSP-TYPE ECR PLASMA [J].
AMEMIYA, H ;
ISHII, S .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1989, 28 (11) :2289-2297
[4]   Transversely magnetized microwave plasma in a rectangular waveguide under cutoff conditions [J].
Bhattacharjee, S ;
Amemiya, H .
REVIEW OF SCIENTIFIC INSTRUMENTS, 1997, 68 (08) :3061-3067
[5]   ELECTRON-CYCLOTRON-RESONANCE PLASMA IN MULTICUSP MAGNETS WITH AXIAL MAGNETIC PLUGGING [J].
MAEDA, M ;
AMEMIYA, H .
REVIEW OF SCIENTIFIC INSTRUMENTS, 1994, 65 (12) :3751-3755
[6]   DEVELOPMENT OF COAXIAL ECR PLASMA SOURCE FOR TUBE INNER COATING [J].
SHIGEMIZU, T ;
OHNO, N ;
FUJIYAMA, H .
MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 1991, 139 :312-318
[7]   COMPACT ELECTRON-CYCLOTRON-RESONANCE ION-SOURCE WITH A PERMANENT-MAGNET [J].
SHIMADA, M ;
TORII, Y .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1993, 11 (04) :1313-1316
[8]   DESIGN AND PERFORMANCE OF AN ELECTRON-CYCLOTRON RESONANCE PLASMA SOURCE FOR STANDARD MOLECULAR-BEAM EPITAXY EQUIPMENT [J].
SITAR, Z ;
PAISLEY, MJ ;
SMITH, DK ;
DAVIS, RF .
REVIEW OF SCIENTIFIC INSTRUMENTS, 1990, 61 (09) :2407-2411
[9]   OVERDENSE PLASMA PRODUCTION USING ELECTRON-CYCLOTRON WAVES [J].
TANAKA, M ;
NISHIMOTO, R ;
HIGASHI, S ;
HARADA, N ;
OHI, T ;
KOMORI, A ;
KAWAI, Y .
JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN, 1991, 60 (05) :1600-1607
[10]  
WIESEMANN K, 1969, ANN PHYS-BERLIN, V23, P275, DOI 10.1002/andp.19694780508
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