Fabrication of thin-film InGaN light-emitting diode membranes by laser lift-off

被引:322
作者
Wong, WS [1 ]
Sands, T
Cheung, NW
Kneissl, M
Bour, DP
Mei, P
Romano, LT
Johnson, NM
机构
[1] Univ Calif Berkeley, Dept Mat Sci & Mineral Engn, Berkeley, CA 94720 USA
[2] Univ Calif Berkeley, Dept Elect Engn & Comp Sci, Berkeley, CA 94720 USA
[3] Xerox Corp, Palo Alto Res Ctr, Elect Mat Lab, Palo Alto, CA 94304 USA
关键词
D O I
10.1063/1.124693
中图分类号
O59 [应用物理学];
学科分类号
摘要
Indium-gallium nitride (InGaN) multiple-quantum-well (MQW) light-emitting diode (LED) membranes, prefabricated on sapphire growth substrates, were created using pulsed-excimer laser processing. The thin-film InGaN MQW LED structures, grown on sapphire substrates, were first bonded onto a Si support substrate with an ethyl cyanoacrylate-based adhesive. A single 600 mJ/cm(2), 38 ns KrF (248 nm) excimer laser pulse was directed through the transparent sapphire, followed by a low-temperature heat treatment to remove the substrate. Free-standing InGaN LED membranes were then fabricated by immersing the InGaN LED/adhesive/Si structure in acetone to release the device from the supporting Si substrate. The current-voltage characteristics and room-temperature emission spectrum of the LEDs before and after laser lift-off were unchanged. (C) 1999 American Institute of Physics. [S0003-6951(99)02636-4].
引用
收藏
页码:1360 / 1362
页数:3
相关论文
共 19 条
  • [1] AMANO H, 1989, JPN J APPL PHYS PT 2, V28, pL21
  • [2] BARTON DL, 1996, SPIE INT SOC OPT ENG, V2694, P64
  • [3] SILICON-ON-INSULATOR WAFER BONDING-WAFER THINNING TECHNOLOGICAL EVALUATIONS
    HAISMA, J
    SPIERINGS, GACM
    BIERMANN, UKP
    PALS, JA
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1989, 28 (08): : 1426 - 1443
  • [4] Kelly MK, 1998, MATER RES SOC SYMP P, V482, P973
  • [5] KELLY MK, 1997, PHYS STATUS SOLIDI A, V159, pR3
  • [6] Dry-etching and characterization of mirrors on III-nitride laser diodes from chemically assisted ion beam etching
    Kneissl, M
    Hofstetter, D
    Bour, DP
    Donaldson, R
    Walker, J
    Johnson, NM
    [J]. JOURNAL OF CRYSTAL GROWTH, 1998, 189 : 846 - 849
  • [7] Material characterization for III-nitride based light emitters
    Kneissl, M
    Bour, DP
    Romano, LT
    Krusor, BS
    McCluskey, M
    Goetz, W
    Johnson, NM
    [J]. LIGHT-EMITTING DIODES: RESEARCH, MANUFACTURING, AND APPLICATIONS II, 1998, 3279 : 69 - 76
  • [8] HIGH DISLOCATION DENSITIES IN HIGH-EFFICIENCY GAN-BASED LIGHT-EMITTING-DIODES
    LESTER, SD
    PONCE, FA
    CRAFORD, MG
    STEIGERWALD, DA
    [J]. APPLIED PHYSICS LETTERS, 1995, 66 (10) : 1249 - 1251
  • [9] MUNIR ZA, 1965, J CHEM PHYS, V42, P4233
  • [10] First III-V-nitride-based violet laser diodes
    Nakamura, S
    [J]. JOURNAL OF CRYSTAL GROWTH, 1997, 170 (1-4) : 11 - 15