Theoretical study of the decomposition mechanism of C4F7N

被引:34
|
作者
Fu, Yuwei [1 ,2 ]
Yang, Aijun [2 ]
Wang, Xiaohua [2 ]
Rong, Mingzhe [2 ]
机构
[1] Xian Univ Technol, Dept Elect Engn, 5 South Jinhua Rd, Xian 710048, Shaanxi, Peoples R China
[2] Xi An Jiao Tong Univ, State Key Lab Elect Insulat & Power Equipment, 28 XianNing West Rd, Xian 710049, Shaanxi, Peoples R China
基金
中国国家自然科学基金;
关键词
C4F7N; decomposition mechanism; decomposition products; rate constant; density functional theory; GAS-MIXTURE; DISCHARGE; CHEMISTRY; SENSORS;
D O I
10.1088/1361-6463/ab0de0
中图分类号
O59 [应用物理学];
学科分类号
摘要
Investigations into alternative gases to reduce the usage of SF6 have great benefits on global warming issues and the health of maintenance personnel. C4F7N is one of the most remarkable replacements for SF6 owing to its good insulating performance, low global warming potential and non-toxicity. The decomposition mechanism of C4F7N is important in evaluating the insulation performance but it is still not clear. Therefore, the B3INP/6-311G(d,p) method in conjunction with transition state theory is used to study the decomposition mechanism of C4F7N. Sixteen reactions are found in the decomposition pathways of C4F7N. The optimized configurations and harmonic vibrational frequencies of selected species are very consistent with experimental data to verify the method adopted in this paper. The potential energy surface of these reactions are obtained and the reaction mechanisms are analyzed. The rate constants over 300 K-3500 K relevant to the insulation breakdown temperature are computed based on the above quantum chemistry calculations and dominant reactions in different temperature regions are selected. For example, reaction R5 (C4F7N -> TS2 -> FCN + CF2CFCF3) is the most important reaction leading to the dissociation of C4F7N below 600K, while reaction R2 (C4F7N -> C2F4CN + CF3) takes the place of reaction R5 over 600K to 3300 K and reaction R3 (C4F7N -> TS1 -> CF2CFCN -> CF4) becomes dominant above 700 K; reaction R15 (CF2CFCNCF3 -> CF2CFCN + CF3) plays the major role in the generation of CF3 with the overwhelming contribution rate. The results obtained here are expected to construct a relatively complete C4F7N decomposition scheme, including the main byproduct formation processes and to lay a theoretical basis for the investigation of its insulation performance.
引用
收藏
页数:14
相关论文
共 50 条
  • [41] C4F7N质量流量转换系数测定方法
    邵先军
    谢成
    丁五行
    王鑫
    高电压技术, 2022, 48 (05) : 1791 - 1797
  • [42] Influence of Three Buffer Gases on Dielectric Strength of C4F7N Mixtures
    Hu S.
    Zhou W.
    Zheng Y.
    Zhang T.
    Wang L.
    Li Z.
    Gaodianya Jishu/High Voltage Engineering, 2020, 46 (01): : 224 - 232
  • [43] Compatibility between C4F7N and the Sealing Material EPDM Used in GIL
    Zheng, Z.
    Li, H.
    Zhou, W.
    Yu, J.
    Wang, H.
    Zhang, J.
    Jiang, Y.
    Zhao, J.
    Yang, L.
    Zhou, Y.
    2019 IEEE CONFERENCE ON ELECTRICAL INSULATION AND DIELECTRIC PHENOMENA (CEIDP), 2019, : 146 - 149
  • [44] Decomposition Properties of C4F7N/N2 Gas Mixture: An Environmentally Friendly Gas to Replace SF6
    Li, Yi
    Zhang, Xiaoxing
    Xiao, Song
    Chen, Qi
    Tang, Ju
    Chen, Dachang
    Wang, Dibo
    INDUSTRIAL & ENGINEERING CHEMISTRY RESEARCH, 2018, 57 (14) : 5173 - 5182
  • [45] Simulation and Experimental Research on Decomposition of Eco-friendly C4F7N/CO2 Gas Mixtures
    Yang Y.
    Gao K.
    Ding L.
    Bi J.
    Yuan S.
    Zhongguo Dianji Gongcheng Xuebao/Proceedings of the Chinese Society of Electrical Engineering, 2023, 43 (01): : 380 - 388
  • [46] Acute Inhalation Toxicity Studies of Gas Insulating Medium C4F7N
    Li Y.
    Zhang X.
    Chen Q.
    Xiao S.
    Fu M.
    Gao Y.
    Gaodianya Jishu/High Voltage Engineering, 2019, 45 (01): : 109 - 116
  • [47] Numerical simulation of streamer discharge with different electrode shapes in C4F7N
    Yan, Xinfeng
    Zhou, Xiaoli
    Li, Ze
    Qian, Yong
    Sheng, Gehao
    AIP ADVANCES, 2023, 13 (03)
  • [48] Engineering the surface of WS2 nanosheets by Con clusters to improve the adsorption of C4F7N decomposition gas molecules: A DFT study
    Albadr, Rafid Jihad
    Taher, Waam mohammed
    Roopashree, R.
    Kashyap, Aditya
    Saini, Suman
    Pathak, Piyus Kumar
    Sharma, Rsk
    Alwan, Mariem
    Jawad, Mahmood Jasem
    Smerat, Aseel
    SURFACE SCIENCE, 2025, 757
  • [49] Excitation and fragmentation of the dielectric gas C4F7N: Electrons vs photons
    Ovad, Tomas
    Sapunar, Marin
    Srsen, Stepan
    Slavicek, Petr
    Masin, Zdenek
    Jones, Nykola C.
    Hoffmann, Soren Vronning
    Rankovic, Milos
    Fedor, Juraj
    JOURNAL OF CHEMICAL PHYSICS, 2023, 158 (01):
  • [50] Dielectric Properties and Synergistic Effect Evaluation Method of C4F7N Mixtures
    Hu, Shizhuo
    Qiu, Rui
    Zhou, Wenjun
    IEEE TRANSACTIONS ON DIELECTRICS AND ELECTRICAL INSULATION, 2024, 31 (02) : 793 - 800