Optimizing band-edge slow light in silicon-on-insulator waveguide gratings

被引：12

作者：

Passoni, Marco ^{[1
,2
]}

Gerace, Dario ^{[1
,2
]}

O'Faolain, Liam ^{[3
,4
]}

Andreani, Lucio Claudio ^{[1
,2
]}

机构：

[1] Univ Pavia, Dept Phys, I-27100 Pavia, Italy

[2] Univ Pavia, CNISM, I-27100 Pavia, Italy

[3] Cork Inst Technol, Ctr Adv Photon & Proc Anal, Cork, Ireland

[4] Tyndall Natl Inst, Cork, Ireland

来源：

OPTICS EXPRESS | 2018年 / 26卷 / 07期

基金：

欧盟地平线“2020”;

关键词：

OPTICAL MODULATORS; SENSITIVITY; FORMULATION; COMPACT;

D O I：

10.1364/OE.26.008470

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

A systematic analysis of photonic bands and group index in silicon grating waveguides is performed, in order to optimize band-edge slow-light behavior in integrated structures with low losses. A combination of numerical methods and perturbation theory is adopted. It is shown that a substantial increase of slow light bandwidth is achieved when decreasing the internal width of the waveguide and the silicon thickness in the cladding region. It is also observed that a reduction of the internal width does not undermine the performance of an adiabatic taper. (c) 2018 Optical Society of America under the terms of the OSA Open Access Publishing Agreement

引用

页码：8470 / 8478

页数：9

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