Anomalous oxidation of Fe-Si alloys under a low oxygen pressure at 800°C

被引：17
作者：
Liu, L. L. [1 ,2 ]
Guo, Q. Q. [1 ]
Liu, S. [1 ]
Ni, C. S. [3 ]
Niu, Y. [1 ]
机构：
[1] Chinese Acad Sci, Inst Met Res, Shenyang 110016, Peoples R China
[2] Live Working Ctr State Grid Corp Hunan, Changsha 410000, Hunan, Peoples R China
[3] Univ St Andrews, Sch Chem, St Andrews KY16 9ST, Fife, Scotland
来源：
CORROSION SCIENCE | 2015年 / 98卷
关键词：
Iron; SEM; Internal oxidation; Amorphous structures; HIGH-TEMPERATURE OXIDATION; INTERNAL OXIDATION; EXTERNAL OXIDATION; INITIAL-STAGE; WATER-VAPOR; AL ALLOYS; SILICON; BEHAVIOR; TRANSITION; KINETICS;
D O I：
10.1016/j.corsci.2015.05.055
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The oxidation of three Fe-xSi alloys (x=5, 9, 13 at.%) under 10(-20) atm O-2 at 800 degrees C formed in all cases SiO2 layers. For Fe-5Si this layer broke down and healed up periodically forming an anomalous internal oxidation zone with spherical and net-shaped SiO2 particles. The SiO2 layer formed on the other two alloys spalled off due to the growth and thermal stress accumulated. The critical silicon content needed for its external oxidation on Fe-Si alloys calculated according to an extension of Wagner's theory under the present experimental conditions is significantly smaller than the experimental results. (C) 2015 Elsevier Ltd. All rights reserved.
引用
收藏
页码：507 / 515
页数：9
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