Low-Voltage InGaZnO Ion-Sensitive Thin-Film Transistors Fabricated by Low-Temperature Process

被引:16
|
作者
Lu, Chih-Hung [1 ]
Hou, Tuo-Hung [1 ]
Pan, Tung-Ming [2 ,3 ]
机构
[1] Natl Chiao Tung Univ, Inst Elect, Dept Elect Engn, Hsinchu 300, Taiwan
[2] Chang Gung Univ, Dept Elect Engn, Taoyuan 33302, Taiwan
[3] Chang Gung Mem Hosp, Div Urol, Taoyuan 33302, Taiwan
关键词
HfO2; InGaZnO; ion-sensitive thin-film transistor (ISTFT); pH sensitivity; FIELD-EFFECT-TRANSISTORS; SENSORS; ENHANCEMENT; HYSTERESIS; OPERATION; DNA;
D O I
10.1109/TED.2016.2614959
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this brief, we developed a low-voltage (V-DS = 0.5 V and V-GS = 0.8 V) InGaZnO ion-sensitive thin-film transistor (ISTFT) sensor using a high-kappa HfO2 sensing membrane grown by low-temperature atomic layer deposition. The InGaZnO TFT exhibited a low threshold voltage of 0.2 V, a high field-effect mobility of 5.9 cm(2)/V-s, a small subthreshold swing of 90 mV/decade, and high I-ON/I-OFF ratio of 2.4x10(7). The pH sensor based on an InGaZnO ISTFT device exhibits a high sensitivity of 60.5 mV/pH and good linearity in the pH range from 3 to 11. Moreover, such a pH ISTFT sensor presents a hysteresis width of 8 mV after a pH loop of 7 -> 4 -> 7 -> 10 -> 7 and a low drift rate of 2.5 mV/h at pH 7.
引用
收藏
页码:5060 / 5063
页数:4
相关论文
共 50 条
  • [31] LOW-TEMPERATURE POLYCRYSTALLINE SILICON THIN-FILM TRANSISTORS FOR DISPLAYS
    HSEIH, BC
    HATALIS, MK
    GREVE, DW
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1988, 35 (11) : 1842 - 1845
  • [32] LOW-TEMPERATURE OPERATION OF POLYCRYSTALLINE SILICON THIN-FILM TRANSISTORS
    MORI, H
    HATA, K
    HASHIMOTO, T
    WU, IW
    LEWIS, AG
    KOYANAGI, M
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1991, 30 (12B): : 3710 - 3714
  • [33] Cadmium sulfide thin-film transistors fabricated by low-temperature chemical-bath deposition
    Voss, C
    Subramanian, S
    Chang, CH
    JOURNAL OF APPLIED PHYSICS, 2004, 96 (10) : 5819 - 5823
  • [34] Polyelectrolyte Dielectrics for Flexible Low-Voltage Organic Thin-Film Transistors in Highly Sensitive Pressure Sensing
    Liu, Ziyang
    Yin, Zhigang
    Wang, Jianbin
    Zheng, Qingdong
    ADVANCED FUNCTIONAL MATERIALS, 2019, 29 (01)
  • [35] High-Mobility Amorphous InGaZnO Thin-Film Transistors With Nitrogen Introduced via Low-Temperature Annealing
    Yu, Yining
    Lv, Nannan
    Zhang, Dongli
    Wei, Yiran
    Wang, Mingxiang
    IEEE ELECTRON DEVICE LETTERS, 2021, 42 (10) : 1480 - 1483
  • [36] Fabrication of ZnO-Based Flexible Thin-Film Transistors by a Low-Temperature Process
    Yang, Jin Woo
    Hyung, Gun Woo
    Lee, Ho Won
    Park, Jae-Hoon
    Koo, Ja Ryong
    Jung, Kyung Seo
    Cho, Eou Sik
    Kwon, Sang Jik
    Kim, Young Kwan
    MOLECULAR CRYSTALS AND LIQUID CRYSTALS, 2011, 550 : 205 - 211
  • [37] Space Environment Effects on Flexible, Low-Voltage Organic Thin-Film Transistors
    Basirico, Laura
    Basile, Alberto Francesco
    Cosseddu, Piero
    Gerardin, Simone
    Cramer, Tobias
    Bagatin, Marta
    Ciavatti, Andrea
    Paccagnella, Alessandro
    Bonfiglio, Annalisa
    Fraboni, Beatrice
    ACS APPLIED MATERIALS & INTERFACES, 2017, 9 (40) : 35150 - 35158
  • [38] Flexible low-voltage high-frequency organic thin-film transistors
    Borchert, James W.
    Zschieschang, Ute
    Letzkus, Florian
    Giorgio, Michele
    Weitz, R. Thomas
    Caironi, Mario
    Burghartz, Joachim N.
    Ludwigs, Sabine
    Klauk, Hagen
    SCIENCE ADVANCES, 2020, 6 (21)
  • [39] Polymer/AlOx bilayer dielectrics for low-voltage organic thin-film transistors
    Choi, Jeong-M.
    Hwang, D. K.
    Jeong, S. H.
    Park, Ji Hoon
    Kim, Eugene
    Kim, Jae Hoon
    Ima, Seongil
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2007, 154 (05) : H331 - H335
  • [40] Printable ion-gel gate dielectrics for low-voltage polymer thin-film transistors on plastic
    Cho, Jeong Ho
    Lee, Jiyoul
    Xia, Yu
    Kim, Bongsoo
    He, Yiyong
    Renn, Michael J.
    Lodge, Timothy P.
    Frisbie, C. Daniel
    NATURE MATERIALS, 2008, 7 (11) : 900 - 906