Evaluation and Application of 600 V GaN HEMT in Cascode Structure

被引:311
作者
Huang, Xiucheng [1 ]
Liu, Zhengyang [1 ]
Li, Qiang [1 ]
Lee, Fred C. [1 ]
机构
[1] Virginia Polytech Inst & State Univ, Ctr Power Elect Syst, Dept Elect & Comp Engn, Blacksburg, VA 24061 USA
关键词
Cascode structure; gallium nitride high electron mobility transistor (GaN HEMT); hard-switching; normally on; soft-switching; BOOST CONVERTER; GALLIUM-NITRIDE; POWER; OPERATION; CIRCUIT; MOSFETS;
D O I
10.1109/TPEL.2013.2276127
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Gallium nitride high electron mobility transistor (GaN HEMT) has matured dramatically over the last few years. A progressively larger number of GaN devices have been manufactured for in field applications ranging from low power voltage regulators to high power infrastructure base-stations. Compared to the state-of-the-art silicon MOSFET, GaN HEMT has a much better figure of merit and shows potential for high-frequency applications. The first generation of 600 V GaN HEMT is intrinsically normally on device. To easily apply normally on GaN HEMT in circuit design, a low-voltage silicon MOSFET is in series to drive the GaN HEMT, which is well known as cascode structure. This paper studies the characteristics and operation principles of a 600 V cascode GaN HEMT. Evaluations of the cascode GaN HEMT performance based on buck converter at hard-switching and soft-switching conditions are presented in detail. Experimental results prove that the cascode GaN HEMT is superior to the silicon MOSFET, but it still needs soft-switching in high-frequency operation due to considerable package and layout parasitic inductors and capacitors. The cascode GaN HEMT is then applied to a 1 MHz 300 W 400 V/12 V LLC converter. A comparison of experimental results with a state-of-the-art silicon MOSFET is provided to validate the advantages of the GaN HEMT.
引用
收藏
页码:2453 / 2461
页数:9
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