Development of plasma chemical vaporization machining and elastic emission machining systems for coherent x-ray optics

被引：48

作者：

Mori, Y ^{[1
]}

Yamauchi, K ^{[1
]}

Yamamura, K ^{[1
]}

Mimura, H ^{[1
]}

Saito, A ^{[1
]}

Kishimoto, H ^{[1
]}

Sekito, Y ^{[1
]}

Kanaoka, M ^{[1
]}

机构：

[1] Osaka Univ, Suita, Osaka 5650871, Japan

来源：

X-RAY MIRRORS, CRYSTALS AND MULTILAYERS | 2001年 / 4501卷

关键词：

ultraprecision machining; X-ray mirror; plasma CVM (chemical vaporization machining); EEM (elastic emission machining); coherent X-ray;

D O I：

10.1117/12.448496

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Plasma CVM (chemical vaporization machining) and EEM (elastic emission machining) systems were developed for coherent X-ray optics fabrication. Figure-correction performances were tested in the spatial wavelength range from submillimeter to several hundreds mm, and those processes were certified to be promising technique to fabricate next-generation mirrors for coherent X-ray beams. A wave-optics simulation code was also developed to feed scientific analysis back to the fabrication technology. A figure measurement technique was also proposed to satisfy the suggestions from the wave-optics simulations. Simulated results indicated the necessity of the figure measurement with subnanometer accuracy having lateral resolution more than submillimeter.

引用

页码：30 / 42

页数：13

共 31 条

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