Silicon semiconductor-assisted Bronsted acid-catalyzed dehydration: Highly selective synthesis of 5-hydroxymethylfurfural from fructose under visible light irradiation

被引:29
作者
Tsutsumi, Ken [1 ]
Kurata, Natsuki [1 ]
Takata, Eri [1 ]
Furuichi, Kayo [1 ]
Nagano, Masaru [1 ]
Tabata, Kenji [1 ]
机构
[1] Miyazaki Univ, Fac Engn, Dept Appl Chem, Miyazaki 8892155, Japan
关键词
Semiconductor; Dehydration; Selective synthesis; Silicon; 5-Hydroxymethylfurfural; ORGANIC-COMPOUNDS; LEVULINIC ACID; CONVERSION; WATER; PHOTOCATALYSIS; GLUCOSE; 5-HYDROXYMETHYL-2-FURALDEHYDE; DECOMPOSITION; MECHANISM; TIO2;
D O I
10.1016/j.apcatb.2013.10.032
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Semiconductor materials are used to promote Bronsted acid-catalyzed dehydration of fructose to 5-hydroxymethylfurfural (HMF) under visible light irradiation. In the proposed reaction system the semiconductors convert light to heat, transferring chemical energy to the substrates. We found that silicon was a more suitable semiconductor for the conversion of fructose to HMF compared with alpha-Fe2O3, WO3, and TiO2. Remarkably, a silicon semiconductor coated with silanol groups (Si-OH) affords HMF in almost quantitative yield (97%) even at 80 degrees C. This result suggests that the Si-OH catalyst provides energy selectively to the starting material fructose and not to desired product HMF, preventing side-reactions. (C) 2013 Elsevier B.V. All rights reserved.
引用
收藏
页码:1009 / 1014
页数:6
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