Development of catalytic chemical vapor deposition apparatus for large size substrates

被引：10
作者：
Osono, S
Kitazoe, M
Tsuboi, H
Asari, S
Saito, K
机构：
[1] ULVAC Inc, Inst Super Mat, Chigasaki, Kanagawa 2538543, Japan
[2] ULVAC Inc, Flat Panel Display Equipment Grp, Chigasaki, Kanagawa 2538543, Japan
来源：
THIN SOLID FILMS | 2006年 / 501卷 / 1-2期
关键词：
Cat-CVD (Hot-wire CVD); large area deposition; silicon; solar cell;
D O I：
10.1016/j.tsf.2005.07.266
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
A Cat-CVD (catalytic chemical vapor deposition, Hot-Wire CVD) apparatus for deposition of large area substrates is developed. Technical issues for a large area deposition apparatus are pointed out and the way to solve such issues is demonstrated, along with deposition performance. It is shown that a large area deposition apparatus as a prototype of future mass-production machine is realized by using the Cat-CVD technology. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码：61 / 64
页数：4
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