Influence of Bias Parameters and Plasma Density on Vacuum Arc Macroparticle Accumulation

被引：1

作者：

Ryabchikov, Alexander I. ^{[1
]}

Sivin, Denis O. ^{[1
]}

Bumagina, Anna I. ^{[1
]}

机构：

[1] Natl Res Tomsk Polytech Univ, Tomsk 634050, Russia

来源：

MATERIALS AND MANUFACTURING PROCESSES | 2015年 / 30卷 / 12期

关键词：

Vacuum; Density; Plasma; Metal; Implantation; Biomedicine; Arc; Macroparticles; Bias; Deposition; Implants;

D O I：

10.1080/10426914.2015.1019094

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Several regularities of the accumulation of vacuum arc metal macroparticles (MP) on the sample on repetitively pulsed biasing (10(5)Hz, 7 mu s, -0.5kV to -3.5kV) have been investigated. It has been shown that the substrate temperature plays a very important role in controlling the MP amounts on the sample. A possibility to change the metal particle number density on the substrate in the range from 10(5)/cm(2) to 10(7)/cm(2), depending on bias pulse parameters, sample temperature, and ion plasma saturation current density, has been demonstrated. The shape of MPs and their adhesion to the substrate surface depends strongly on the MP energy balance in a high-voltage space charge sheath.

引用

页码：1471 / 1475

页数：5

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