Characterization study of plasma polymerized hexamethyldisiloxane thin films

被引：0
作者：
Lee, SH
Park, JK
Park, GB
Cho, KS
Woo, HW
Lee, DC
机构：
来源：
PROCEEDINGS OF THE 5TH INTERNATIONAL CONFERENCE ON PROPERTIES AND APPLICATIONS OF DIELECTRIC MATERIALS, VOLS 1 AND 2 | 1997年
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中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
In this paper, we investigated characteristics of Hexamethyldisiloxane thin films by plasma polymerization. Thin films were prepared by interelectrode capacitively coupled type apparatus and on conditions with carrier gas flow rate of 11 [cc/min], gas pressure of 0.1 [Torr], discharge frequency of 13.56 [MHz] and discharge power of 30 similar to 90 [W]. The relative dielectric constant and dielectric loss tangent of thin films showed 3.212 similar to 3.805 and 0.0026 similar to 0.0451 in alternating-frequency of 10(3) similar to 10(6) [Hz].
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页码：639 / 641
页数：3
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