Microfabrication of millimeter wave vacuum electron devices by two-step deep-etch x-ray lithography

被引：69

作者：

Shin, YM

So, JK

Han, ST

Jang, KH

Park, GS ^{[1
]}

Kim, JH

Chang, SS

机构：

[1] Seoul Natl Univ, Sch Phys, Seoul 151747, South Korea

[2] Seoul Natl Univ, NSI, NCRC, Seoul 151747, South Korea

[3] POSTECH, Pohang Accelerator Lab, Pohang 790784, South Korea

来源：

APPLIED PHYSICS LETTERS | 2006年 / 88卷 / 09期

关键词：

D O I：

10.1063/1.2178770

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The circuits for millimeter wave vacuum electron devices with all circuit elements including an electron beam tunnel are microfabricated by two-step deep-etch x-ray lithography (x-ray LIGA). The discrepancies of eigenfrequency between experiment and simulation are within 1.1% in a coupled-cavity structure and 1.4% in a folded waveguide structure when the operating frequency is about 100 GHz. Furthermore, a measured tolerance of below 2 mu m, and a measured surface roughness of 20-70 nm, of LIGA-fabricated circuits implies the two-step LIGA microfabrication has potential applications up to the submillimeter wave region. (c) 2006 American Institute of Physics.

引用

页数：3

共 17 条

[1] CHERENKOV RADIATION FROM FEMTOSECOND OPTICAL PULSES IN ELECTRO-OPTIC MEDIA [J].