Effect of Li addition on the formation of Na-β/β"-alumina film by laser chemical vapor deposition

被引：40

作者：

Chi, Chen ^{[1
,2
]}

Katsui, Hirokazu ^{[1
]}

Goto, Takashi ^{[1
]}

机构：

[1] Tohoku Univ, Inst Mat Res, Aoba Ku, 2-1-1 Katahira, Sendai, Miyagi 9808577, Japan

[2] Wuhan Inst Technol, Key Lab Green Chem Proc, Minist Educ Chem Engn & Pharm, Wuhan 430070, Peoples R China

来源：

CERAMICS INTERNATIONAL | 2017年 / 43卷 / 01期

关键词：

Beta-alumina; Laser chemical vapor deposition; Microstructure; Low deposition temperature; Stabilization; BETA-ALUMINA; CRYSTAL-STRUCTURE; POLYCRYSTALLINE; MICROSTRUCTURE; ELECTROLYTE; GROWTH;

D O I：

10.1016/j.ceramint.2016.10.077

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Films composed of a mixture of Na-beta- and beta'' aluminas (beta/beta''-alumina) were prepared via laser chemical vapor deposition (CVD) upon the addition of Li. The effect of the Li source gas on the phase formation, microstructure and deposition rates of the beta/beta''-alumina films was investigated. The Na-beta/beta''-alumina films were formed at a Li/Al precursor supply ratio (R-Li/Al) of 0.11.0 within a deposition temperature (T-dep) range of 11001220 K. The Na-beta/beta''-alumina phase was exclusively formed at T-dep = 11651185 K and R-Li/Al = 0.10.5, whereas alpha-Al2O3 (with minor amounts of LiAlO2 and LiAl5O8) was predominantly observed at T-dep > 1223 K and R-Li/Al > 1.0. The Na-beta/beta''-alumina films were composed of polygonal facets in sizes of several hundred nanometers with a columnar cross section. The deposition rate of the Na-beta/beta''-alumina film was 60 mu m h(-1).

引用

页码：1278 / 1283

页数：6

共 29 条

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