Sb incorporation at GaAs(001)-(2 x 4) surfaces

被引:10
作者
Bickel, J. E. [1 ]
Pearson, Chris [2 ]
Millunchick, J. Mirecki [1 ]
机构
[1] Univ Michigan, Dept Mat Sci & Engn, Ann Arbor, MI 48109 USA
[2] Univ Michigan, Dept Comp Sci Engn Sci & Phys, Flint, MI 48502 USA
关键词
Molecular beam epitaxy; Surface reconstruction; Self-assembly; QUANTUM DOTS; GROWTH; GAAS; RECONSTRUCTIONS; EVOLUTION; EPITAXY;
D O I
10.1016/j.susc.2008.09.042
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We examine the Sb incorporation and resulting surface reconstructions of Sb and GaSb deposited on GaAs(0 0 1). These films exhibit a mixed surface reconstruction of alpha 2(2 x 4) and alpha(4 x 3). Initially, Sb reacts with Ga On the Surface to form 2D islands of GaSb with an alpha(4 x 3) surface reconstruction. The 2D islands grow to a critical size of 30 nm(2), beyond which the atomic surface structure of the 2D island transforms to a alpha 2(2 x 4) reconstruction in order to reduce the strain induced surface energy. This transformation is limited by the availability of Ga, which is necessary in higher quantities for the a2(2 x 4) reconstruction than for the alpha(4 x 3). The transformation results in a mixed alpha(2 x 4)-alpha(4 x 3) surface where the surface reconstruction is Coupled to the surface morphology, which may in the future provide a pathway for self-assembly of structures. (C) 2008 Elsevier B.V. All rights reserved.
引用
收藏
页码:14 / 21
页数:8
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