A surface-reactive rod-coil diblock copolymer: Nano- and micropatterned polymer brushes

被引:66
作者
Park, JW [1 ]
Thomas, EL [1 ]
机构
[1] MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA
关键词
D O I
10.1021/ja017116v
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
A diblock copolymer consisting of poly(3-(triethoxysilyl)propylisocyanate) (PIC) and polystyrene(PS) was synthesized by anionic polymerization. A polymeric monolayer of the block copolymer was formed on silica substrates by various grafting techniques such as immersion, casting, or contact-printing. The PIC block adheres covalently to Si substrates in an in-plane fashion due to its extended rodlike conformation and reactivity to the silica. The polystyrene blocks aggregate to form mounds on the surface resulting in a new type of nanopatterned polymer brush. The self-limiting adsorption of the rod coils results in a thickness of about 5 nm regardless of the solution concentration and coating method. This particular property allowed microcontact printing directly onto silicon or glass substrates. The resulting surface morphology consisted of nanoscale domains given by the block copolymer and uniform thickness micropatterns transferred from the stamp within the printed area. This study offers a simple new method to prepare a covalent polymeric monolayer with nano- and micropatterns, which can be performed directly onto various silicon-based substrates. Copyright © 2002 American Chemical Society.
引用
收藏
页码:514 / 515
页数:2
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