Effect of HF etching on the surface quality and laser-induced damage of fused silica

被引：43

作者：

Zheng, Zhi ^{[1
,2
]}

Zu, Xiaotao ^{[1
]}

Jiang, Xiaodong ^{[2
]}

Xiang, Xia ^{[1
]}

Huang, Jin ^{[2
]}

Zhou, Xinda ^{[2
]}

Li, Chunhong ^{[2
,3
]}

Zheng, Wanguo ^{[2
]}

Li, Li ^{[1
]}

机构：

[1] Univ Elect Sci & Technol China, Dept Appl Phys, Chengdu 610054, Peoples R China

[2] China Acad Engn Phys, Res Ctr Laser Fus, Mianyang 621900, Peoples R China

[3] Univ Sci & Technol, Dept Phys, Beijing 100083, Peoples R China

来源：

OPTICS AND LASER TECHNOLOGY | 2012年 / 44卷 / 04期

基金：

中国国家自然科学基金;

关键词：

Nanoindentation; Laser-induced damage; HF etch; POLISHING-INDUCED CONTAMINATION; NATIONAL-IGNITION-FACILITY; SUBSURFACE DAMAGE; 351; NM; GLASS; WAVELENGTH; INCLUSIONS; THRESHOLD; DENSITY; OPTICS;

D O I：

10.1016/j.optlastec.2011.10.013

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

The surface hardness of polished and HF etched fused silica has been investigated by nanoindentation technique. The results of polished fused silica indicate that the hardness of surface layer is greater than that of the bulk material. The difference should be attributed to the polishing induced deformation of the thin surface layer. The various removal depths of surface layer by HF etching has been confirmed by the surface hardness results. The initial laser damage threshold and damage possibility of unetched and etched samples were also measured. The results show a great improvement of damage resistance by slight etching and a reduction by excess etching. The correlation between surface hardness and damage threshold indicates that the mechanical strength plays an important role in the initiation of laser-induced damage. (C) 2011 Elsevier Ltd. All rights reserved.

引用

页码：1039 / 1042

页数：4

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