Direct observations of crystallization processes of amorphous GeSn during thermal annealing: A temperature window for suppressing Sn segregation

被引:9
作者
Higashiyama, Masashi [1 ]
Ishimaru, Manabu [1 ]
Okugawa, Masayuki [2 ]
Nakamura, Ryusuke [2 ]
机构
[1] Kyushu Inst Technol, Dept Mat Sci & Engn, Kitakyushu, Fukuoka 8048550, Japan
[2] Osaka Prefecture Univ, Dept Mat Sci, Sakai, Osaka 5998531, Japan
关键词
ELECTRON-MICROSCOPY; DIFFRACTION;
D O I
10.1063/1.5086480
中图分类号
O59 [应用物理学];
学科分类号
摘要
The solubility limit of tin (Sn) in germanium (Ge) is very small, and, therefore, it is difficult to synthesize high Sn concentration GeSn crystals by conventional methods. An amorphous phase can contain elements beyond the solubility limit of the crystal state, and, therefore, recrystallization of the amorphous alloy is one of the possible ways to realize materials far from the equilibrium state. To suppress Sn precipitation during thermal annealing, knowledge of crystallization processes is required. In the present study, amorphous GeSn thin films with different Sn concentrations were prepared by sputtering, and their crystallization processes were examined by in situ transmission electron microscopy. It was found that the crystallization temperature decreases with increasing Sn concentration, and it became lower than the eutectic temperature when the Sn concentration exceeded similar to 25 at.%. Radial distribution function analyses revealed that phase decomposition occurs in the amorphous state of the specimens which crystallize below the eutectic temperature, and Sn crystallites were simultaneously precipitated with crystallization. On the other hand, no remarkable phase decomposition was detected in amorphous GeSn with <25 at.% Sn. Sn precipitation occurred at a higher temperature than the crystallization in these specimens, and the difference between the crystallization and Sn precipitation temperatures became large with decreasing Sn concentration. Because of the existence of this temperature difference, a temperature window for suppressing Sn segregation existed. We demonstrated that large GeSn grains with high Sn concentration could be realized by annealing the specimens within the temperature window. Published under license by AIP Publishing.
引用
收藏
页数:8
相关论文
共 39 条
  • [1] Band anticrossing in highly mismatched SnxGe1-x semiconducting alloys
    Alberi, K.
    Blacksberg, J.
    Bell, L. D.
    Nikzad, S.
    Yu, K. M.
    Dubon, O. D.
    Walukiewicz, W.
    [J]. PHYSICAL REVIEW B, 2008, 77 (07):
  • [2] Ge-Sn semiconductors for band-gap and lattice engineering
    Bauer, M
    Taraci, J
    Tolle, J
    Chizmeshya, AVG
    Zollner, S
    Smith, DJ
    Menendez, J
    Hu, CW
    Kouvetakis, J
    [J]. APPLIED PHYSICS LETTERS, 2002, 81 (16) : 2992 - 2994
  • [3] In situ transmission electron microscopy observations of the crystallization of amorphous Ge films
    Cao, Z. H.
    Liu, P.
    Meng, X. K.
    Tang, S. C.
    Lu, H. M.
    [J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2009, 94 (02): : 393 - 398
  • [4] Chen, 2011, APPL PHYS LETT, V99
  • [5] Ultra-high-speed lateral solid phase crystallization of GeSn on insulator combined with Sn-melting-induced seeding
    Chikita, H.
    Matsumura, R.
    Kai, Y.
    Sadoh, T.
    Miyao, M.
    [J]. APPLIED PHYSICS LETTERS, 2014, 105 (20)
  • [6] Chizmeshya AVG, 2003, CHEM MATER, V15, P2511, DOI [10.1021/cm0300011, 10.1021/cm030001l]
  • [7] Competition of optical transitions between direct and indirect bandgaps in Ge1-xSnx
    Du, Wei
    Ghetmiri, Seyed A.
    Conley, Benjamin R.
    Mosleh, Aboozar
    Nazzal, Amjad
    Soref, Richard A.
    Sun, Greg
    Tolle, John
    Margetis, Joe
    Naseem, Hameed A.
    Yu, Shui-Qing
    [J]. APPLIED PHYSICS LETTERS, 2014, 105 (05)
  • [8] RADIAL-DISTRIBUTION FUNCTIONS OF AMORPHOUS-SILICON
    FORTNER, J
    LANNIN, JS
    [J]. PHYSICAL REVIEW B, 1989, 39 (08): : 5527 - 5530
  • [9] Higashiyama M., 2018, P MAT SCI TECHN 2018, P284
  • [10] Hirata A, 2011, NAT MATER, V10, P28, DOI [10.1038/nmat2897, 10.1038/NMAT2897]