Enhanced luminescence of CuI thin film scintillator by reducing Fresnel reflection

被引：0
作者：
Tong, Fei [1 ]
Zhu, Zhichao [1 ]
Liu, Bo [1 ]
Yi, Yasha [2 ]
Gu, Mu [1 ]
Chen, Hong [1 ]
机构：
[1] Tongji Univ, Dept Phys, Shanghai Key Lab Special Artificial Microstruct M, Shanghai 200092, Peoples R China
[2] CUNY, SI GC, New York, NY 10016 USA
来源：
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT | 2013年 / 707卷
关键词：
CuI; Thin film scintillator; Antireflection coating; CRYSTAL-GROWTH;
D O I：
10.1016/j.nima.2012.12.117
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
CuI thin film scintillator has potential applications in radiation detection systems due to its fast component of luminescence. Severe Fresnel reflection due to its large refractive index decreases its external quantum efficiency. In this article, we design an antireflection coating of SiO2 to efficiently eliminate Fresnel reflection and thus improve luminescence intensity. The optimal thickness of coating aimed at the maximum transmission for the omni-directional integration is obtained. The reduced Fresnel reflection by the antireflection coating is based upon the gradient-index and the interference effect. The luminescence intensity with an antireflection coating is increased by 20% at the emission peak wavelength. (C) 2013 Elsevier B.V. All rights reserved.
引用
收藏
页码：120 / 122
页数：3
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