Tuning Effect of N2 on Atmospheric-Pressure Cold Plasma CVD of TiO2 Photocatalytic Films

被引：10

作者：

Di Lanbo ^{[1
]}

Li Xiaosong ^{[1
]}

Zhao Tianliang ^{[1
]}

Chang Dalei ^{[1
]}

Liu Qianqian ^{[1
]}

Zhu Aimin ^{[1
]}

机构：

[1] Dalian Univ Technol, Lab Plasma Phys Chem, Sch Phys & Optoelect Engn, Dalian 116024, Peoples R China

来源：

PLASMA SCIENCE & TECHNOLOGY | 2013年 / 15卷 / 01期

基金：

中国国家自然科学基金;

关键词：

plasma CVD; TiO2 photocatalytic films; atmospheric-pressure cold plasma; dielectric barrier discharge (DBD); optical emission spectra (OES); CHEMICAL-VAPOR-DEPOSITION; DIELECTRIC BARRIER DISCHARGES; TITANIUM-DIOXIDE; NONEQUILIBRIUM; COATINGS; ANATASE; TEMPERATURE; OXIDATION; POWDERS;

D O I：

10.1088/1009-0630/15/1/11

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

To deposit TiO2 films through plasma CVD, the partial pressure ratio of O-2 to TiCl4 should be greater than the stoichiometric ratio (p(O2)/p(TiCl4) > 1). However, this may lead to the formation of powder instead of film on the substrate when using volume dielectric barrier discharge (volume-DBD) at atmospheric pressure. In this study, by adding N-2 into the working gas Ar, TiO2 photocatalytic films were successfully fabricated in the presence of excess O-2 (p(O2)/p(TiCl4) = 2.6) by using a wire-to-plate atmospheric-pressure volume-DBD. The tuning effect of N-2 on the deposition of TiO2 film was studied in detail. The results showed that by increasing the N-2 content, the deposition rate and particle size of the TiO2 film were reduced, and its photocatalytic activity was enhanced. The tuning mechanism of N-2 is further discussed.

引用

页码：64 / 69

页数：6

共 32 条

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