Construction of a cooling and heating substrate holder for the preparation of thin films for electron microscopy

被引：0
|
作者：
Ott, P [1 ]
Günter, JR [1 ]
机构：
[1] Univ Zurich, Inst Inorgan Chem, Div Chem Elect Microscopy, CH-8057 Zurich, Switzerland
来源：
MICROSCOPY RESEARCH AND TECHNIQUE | 1999年 / 45卷 / 02期
关键词：
D O I：
暂无
中图分类号：
R602 [外科病理学、解剖学]; R32 [人体形态学];
学科分类号：
100101 ;
摘要：
The PVD preparation of thin, oriented films for electron microscopy of materials with high adatom mobilities on the substrates requires cooling of the substrate holder. The construction of such a holder for cooling the substrate to -50 and heating it to 500 degrees C is described. Microsc. Res. Tech. 45:132-133, 1999. (C) 1999 Wiley-Liss, Inc.
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页码：132 / 133
页数：2
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