Silicon Oxide Passivation of Single-Crystalline CVD Diamond Evaluated by the Time-of-Flight Technique

被引:4
作者
Kovi, Kiran Kumar [1 ]
Majdi, Saman [1 ]
Gabrysch, Markus [1 ]
Isberg, Jan [1 ]
机构
[1] Uppsala Univ, Div Elect, Dept Engn Sci, SE-75121 Uppsala, Sweden
基金
瑞典研究理事会;
关键词
DRIFT VELOCITY-MEASUREMENT; CHARGE-TRANSPORT; MOBILITY; DETECTORS; SYSTEM;
D O I
10.1149/2.004405ssl
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The excellent material properties of diamond make it highly desirable for many extreme electronic applications that are out of reach of conventional electronic materials. For commercial diamond devices to become a reality, it is necessary to have an effective surface passivation since the passivation determines the ability of the device to withstand high surface electric fields. In this paper we present data from lateral Time-of-Flight studies on SiO2-passivated intrinsic single-crystalline CVD diamond. The SiO2 films were deposited using three different techniques. The influence of the passivation on hole transport was studied, which resulted in the increase of hole mobilities. The results from the three different passivations are compared. (C) 2014 The Electrochemical Society. All rights reserved.
引用
收藏
页码:P65 / P68
页数:4
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