Diffractive optics calibrator: measurement of etching variations for binary computer-generated holograms

被引：25
作者：
Cai, Wenrui [1 ]
Zhou, Ping [1 ]
Zhao, Chunyu [1 ]
Burge, James H. [1 ]
机构：
[1] Univ Arizona, Coll Opt Sci, Tucson, AZ 85721 USA
来源：
APPLIED OPTICS | 2014年 / 53卷 / 11期
关键词：
SENSITIVITY; GRATINGS;
D O I：
10.1364/AO.53.002477
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
We present a new device, the diffractive optics calibrator (DOC), for measuring etching variations of computer-generated holograms (CGHs). The intensity distribution of the far-field diffraction pattern is captured and fitted to a parametric model to obtain local etching parameters such as the duty cycle, etching depth, and grating period. The sensitivity of each etching parameter is analyzed, and design choices are provided. For the wavefront created by the CGH, the DOC is capable of measuring variations in these parameters that cause 1 nm peak-to-valley phase errors. System performance is verified by measurements from a phase shift Fizeau interferometer. This device will be used primarily for quality control of the CGHs. The measurement results can be used to evaluate the fabrication performance and guide future design. DOC is also capable of generating an induced phase error map for calibration. Such calibration is essential for measuring free-form aspheric surfaces with 1 nm root-mean-square accuracy. (c) 2014 Optical Society of America
引用
收藏
页码：2477 / 2486
页数：10
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