Synthesis and property of noria (water-wheel like macrocycle) derivatives with pendant alkoxyl and adamantyl ester groups, and their application for extreme ultraviolet resist

被引：22

作者：

Niina, Nobumitsu ^{[1
]}

Kudo, Hiroto ^{[2
]}

Oizumi, Hiroaki ^{[3
]}

Itani, Toshiro ^{[3
]}

Nishikubo, Tadatomi ^{[4
]}

机构：

[1] Kanagawa Univ, Grad Sch Engn, Dept Appl Chem, Kanagawa Ku, Yokohama, Kanagawa 2218686, Japan

[2] Kansai Univ, Fac Chem Mat & Bioengn, Dept Chem & Mat Engn, Suita, Osaka 5648680, Japan

[3] Selete Semicond Leading Edge Technol Inc, Res Dept 3, Tsukuba, Ibaraki 3058569, Japan

[4] Kanagawa Univ, Fac Engn, Dept Mat & Life Chem, Kanagawa Ku, Yokohama, Kanagawa 2218686, Japan

来源：

THIN SOLID FILMS | 2013年 / 534卷

关键词：

Synthesis; Cyclic oligomer; Resist; Noria; Extreme ultraviolet; Dynamic covalent chemistry; Photo-acid generator; CALIXARENE NEGATIVE RESIST; MOLECULAR GLASS RESISTS; ELECTRON-BEAM RESIST; HIGH-RESOLUTION; LITHOGRAPHY;

D O I：

10.1016/j.tsf.2013.02.016

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Noria derivatives with pendant methoxy and adamantyl ester moieties (noria(MP)-AD(n)) were synthesized by the substitution reaction of noria analogues with 12 methoxy groups (noria(MP)) and 2-bromoacetyloxy-2-methyladamantane (BMA), and their degrees of introduction of adamantyl ester moieties (DI) could be controlled by the feed ratios of noria(MP) and BMA. The physical properties such as solubility, film-forming ability, and thermal stability of noriaMP-AD(n) were also examined to assess the suitability for application as extreme ultraviolet (EUV)-resist materials. The patterning property of noria(MP)-AD(18) (DI= 18) and noria(MP)-AD(54) (DI= 54) was investigated in an EUV-resist system, and noria(MP)-AD(18) yielded higher resolution than noriaMP-AD54, providing a clear line and space pattern with a resolution of 32 nm and a line-width roughness of 10.5 nm by exposure dose of 9.0 mJ/cm(2). (C) 2013 Elsevier B.V. All rights reserved.

引用

页码：459 / 464

页数：6

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