Kinetic mechanisms in ion-induced ripple formation on Cu(001) surfaces

被引：9
|
作者：
Chason, E [1 ]
Chan, WL [1 ]
机构：
[1] Brown Univ, Div Engn, Providence, RI 02912 USA
来源：
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 2006年 / 242卷 / 1-2期
关键词：
self-organization and patterning; surface structure; ion beam processing;
D O I：
10.1016/j.nimb.2005.08.027
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
The formation of ion-induced ripples on Cu(001) surfaces is the result of competing kinetic mechanisms for roughening and smoothing. A rate equation based on the Bradley-Harper instability and the effect of barriers to interlayer transport enables us to identify different regimes of pattern formation corresponding to different processing conditions. We use this approach to interpret measurements of ripple formation on Cu(001) surfaces. The temperature and flux dependence of the wavelength is used to determine the kinetic regime for production and transport of mobile surface defects. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码：232 / 236
页数：5
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