Controlled pore-size patterning in thin silica film.

被引：0
|
作者：
Singh, S [1 ]
Sasaki, DY [1 ]
Cesarano, J [1 ]
Hurd, AJ [1 ]
机构：
[1] SANDIA NATL LABS,ALBUQUERQUE,NM 87106
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 1997年 / 213卷
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D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
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页码：181 / COLL
页数：1
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