The initial stages of Ge growth on vicinal Si(001) studied by reflectance anisotropy spectroscopy

被引:5
作者
Power, JR
Weightman, P
Bose, S
Shkrebtii, AI
Del Sole, R
机构
[1] Univ Liverpool, IRC Surface Sci, Liverpool L69 3BX, Merseyside, England
[2] Tech Univ Berlin, Inst Theoret Phys, D-10623 Berlin, Germany
[3] Univ Toronto, Dept Phys, Toronto, ON M5S 1A7, Canada
[4] Univ Roma Tor Vergata, Dept Phys, I-00133 Rome, Italy
关键词
dimer; germanium; growth; reflectance anisotropy spectroscopy; Si(001);
D O I
10.1016/S0039-6028(99)00502-6
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Reflectance anisotropy spectroscopy (RAS) is employed to follow the initial room temperature growth of Ge dimer layers on clean vicinal Si(001)-(1 x 2). The experimental data shows structure in the region of 2.4 eV which changes sign depending on Ge dimer orientation. Comparison with microscopic calculations for one monolayer and two monolayer Ge coverages reveals excellent agreement with experiment, demonstrating that surface states localised on Ge dimers are responsible for the RA response in the region of 2.4 eV. This provides the first clear and unambiguous proof that RAS can be sensitive to dimer orientation. The origin of RA growth oscillations, their relationship to dimer orientation, and variation with monitoring energy are definitively explained for the Ge/Si(001) system. (C) 1999 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:373 / 376
页数:4
相关论文
共 24 条
  • [1] KINETIC LIMITS OF MONOLAYER GROWTH ON (001) GAAS BY ORGANOMETALLIC CHEMICAL-VAPOR DEPOSITION
    ASPNES, DE
    COLAS, E
    STUDNA, AA
    BHAT, R
    KOZA, MA
    KERAMIDAS, VG
    [J]. PHYSICAL REVIEW LETTERS, 1988, 61 (24) : 2782 - 2785
  • [2] ANISOTROPIES IN THE ABOVE BAND-GAP OPTICAL-SPECTRA OF CUBIC SEMICONDUCTORS
    ASPNES, DE
    STUDNA, AA
    [J]. PHYSICAL REVIEW LETTERS, 1985, 54 (17) : 1956 - 1959
  • [3] DIELECTRIC FUNCTIONS AND OPTICAL-PARAMETERS OF SI, GE, GAP, GAAS, GASB, INP, INAS, AND INSB FROM 1.5 TO 6.0 EV
    ASPNES, DE
    STUDNA, AA
    [J]. PHYSICAL REVIEW B, 1983, 27 (02) : 985 - 1009
  • [4] THE GE STRANSKI-KRASTANOV GROWTH MODE ON SI(001)(2X1) TESTED BY X-RAY PHOTOELECTRON AND AUGER-ELECTRON DIFFRACTION
    DIANI, M
    AUBEL, D
    BISCHOFF, JL
    KUBLER, L
    BOLMONT, D
    [J]. SURFACE SCIENCE, 1993, 291 (1-2) : 110 - 116
  • [5] Atomic structure of the Sb-stabilized GaAs(100)-(2x4) surface
    Esser, N
    Shkrebtii, AI
    ReschEsser, U
    Springer, C
    Richter, W
    Schmidt, WG
    Bechstedt, F
    DelSole, R
    [J]. PHYSICAL REVIEW LETTERS, 1996, 77 (21) : 4402 - 4405
  • [6] TRANSMISSION-ION-CHANNELING INVESTIGATION OF GE ADSORBED ON THE SI(100) SURFACE AT SUBMONOLAYER COVERAGE
    GRANT, MW
    DIELEMAN, DJ
    BOSHART, MA
    SEIBERLING, LE
    [J]. PHYSICAL REVIEW B, 1994, 49 (23): : 16534 - 16538
  • [7] Theoretical evidence concerning mixed dimer growth on the Si(001)(2x1)-Ge surface
    Jenkins, SJ
    Srivastava, GP
    [J]. JOURNAL OF PHYSICS-CONDENSED MATTER, 1996, 8 (36) : 6641 - 6651
  • [8] SURFACE SCIENCE AT ATMOSPHERIC-PRESSURE - RECONSTRUCTIONS ON (001) GAAS IN ORGANOMETALLIC CHEMICAL VAPOR-DEPOSITION
    KAMIYA, I
    ASPNES, DE
    TANAKA, H
    FLOREZ, LT
    HARBISON, JP
    BHAT, R
    [J]. PHYSICAL REVIEW LETTERS, 1992, 68 (05) : 627 - 630
  • [9] Reflectance difference spectroscopy: Experiment and theory for the model system Si(001):As and application to Si(001)
    Kipp, L
    Biegelsen, DK
    Northrup, JE
    Swartz, LE
    Bringans, RD
    [J]. PHYSICAL REVIEW LETTERS, 1996, 76 (15) : 2810 - 2813
  • [10] GROWTH OF GE ON SI(100) AND SI(113) STUDIED BY STM
    KNALL, J
    PETHICA, JB
    [J]. SURFACE SCIENCE, 1992, 265 (1-3) : 156 - 167