Study on the influence of nitrogen on titanium nitride in a dc post magnetron sputtering plasma system

被引：15

作者：

Borah, Sankar Moni ^{[1
]}

Bailung, Heremba ^{[1
]}

Pal, Arup Ratan ^{[1
]}

Chutia, Joyanti ^{[1
]}

机构：

[1] Inst Adv Study Sci & Technol, Plasma Phys Lab, Div Mat Sci, Gauhati 781035, Assam, India

来源：

JOURNAL OF PHYSICS D-APPLIED PHYSICS | 2008年 / 41卷 / 19期

关键词：

D O I：

10.1088/0022-3727/41/19/195205

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The characteristics of direct current (dc) glow discharge plasma have been studied in a post magnetron device with an argon and nitrogen gas mixture. The introduction of nitrogen modifies the discharge leading to modifications of plasma parameters, transport mechanism and the cathode sheath. The electron energy distribution function, density and temperature profile are measured to characterize the discharge. Measured plasma potential profiles show the modification of the structure of the cathode sheath and confinement space variation. Optical emission spectroscopy is used to identify prominent transitions of the different species in the discharge. The discharge mode in argon undergoes a transition from metallic mode to reactive mode when nitrogen concentration exceeds argon.

引用

页数：9

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