Tunnel Field-Effect Transistors: State-of-the-Art

被引:521
作者
Lu, Hao [1 ]
Seabaugh, Alan [1 ]
机构
[1] Univ Notre Dame, Dept Elect Engn, Notre Dame, IN 46556 USA
关键词
Band-to-band tunneling; sub-threshold swing; TFET; tunnel field-effect transistor; tunneling; INTERFACE TRAPS; PERFORMANCE; INAS; FETS;
D O I
10.1109/JEDS.2014.2326622
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Progress in the development of tunnel field-effect transistors (TFETs) is reviewed by comparing experimental results and theoretical predictions against 16-nm FinFET CMOS technology. Experiments lag the projections, but sub-threshold swings less than 60 mV/decade are now reported in 14 TFETs. The lowest measured sub-threshold swings approaches 20 mV/decade, however, the measurements at these lowest values are not based on many points. The highest current at which sub-threshold swing below 60 mV/decade is observed is in the range 1-10 nA/mu m. A common approach to TFET characterization is proposed to facilitate future comparisons.
引用
收藏
页码:44 / 49
页数:6
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