Controlling Electron Injection in Laser Plasma Accelerators Using Multiple Pulses

被引：4

作者：

Matlis, N. H. ^{[1
]}

Geddes, C. G. R. ^{[1
]}

Plateau, G. R. ^{[1
]}

Esarey, E. ^{[1
]}

Schroeder, C. ^{[1
]}

Bruhwiler, D. ^{[2
]}

Cormier-Michel, E. ^{[2
]}

Chen, M. ^{[3
]}

Yu, L. ^{[1
]}

Leemans, W. P. ^{[1
,4
]}

机构：

[1] Univ Calif Berkeley, Lawrence Berkeley Natl Lab, Berkeley, CA 94720 USA

[2] Tech X Corp, Boulder, CO 80303 USA

[3] Jiao Tong Univ, Shanghai 200240, Peoples R China

[4] Univ Calif, Berkeley, CA 94720 USA

来源：

ADVANCED ACCELERATOR CONCEPTS | 2012年 / 1507卷

关键词：

Colliding Pulse; Laser; Plasma; Accelerator; Wakefield;

D O I：

10.1063/1.4773786

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Use of counter-propagating pulses to control electron injection in laser-plasma accelerators promises to be an important ingredient in the development of stable devices. We discuss the colliding pulse scheme and associated diagnostics.

引用

页码：717 / 721

页数：5

共 5 条

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