Self-limited growth of the CaF nanowire on the Si(5512)-2 x 1 template

被引:5
作者
Kim, Hidong
Duvjir, Ganbat
Dugerjav, Otgonbayar
Li, Huiting
Motlak, Moaaed
Arvisbaatar, Amarmunkh
Seo, Jae M. [1 ]
机构
[1] Chonbuk Natl Univ, Dept Phys, Jeonju 561756, South Korea
基金
新加坡国家研究基金会;
关键词
Self-assembly; Calcium fluoride; Silicon; High index single crystal surfaces; Scanning tunneling microscopy; Synchrotron radiation photoelectron spectroscopy; SCANNING-TUNNELING-MICROSCOPY; EPITAXIAL-GROWTH; INITIAL-STAGES; CAF2/SI(111) INTERFACE; SILICON SURFACES; ATOMIC-STRUCTURE; SI(111); NANOSTRUCTURES; DIFFRACTION; INSULATORS;
D O I
10.1016/j.susc.2012.05.021
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The atomic structure and interfacial bonding of the ordered-and-isolated CaF nanowires on Si(5 5 12)-2 x 1 have been disclosed by scanning tunneling microscopy and synchrotron photoemission spectroscopy. Initially. CaF molecules dissociated from thermally deposited CaF2 molecules are adsorbed preferentially on the chain structures of Si(5 5 12)-2 x 1 held at 500 degrees C. With increasing CaF2 deposition amount, one-dimensional (1D) CaF nanowires composed of (113) and (111) facets are formed. The line density of these CaF nanowires increases as a function of deposition amount. Finally, at a submonolayer coverage, the surface is saturated with these 1D nanowires except for the (225) subunit, while the original period of Si(5 5 12)-2 x 1, 5.35 nm, is preserved. It has been deduced by the present studies that, owing to these preferential adsorption of CaF and facet-dependent growth of a CaF layer within a unit periodic length of Si(5 5 12)-2 x 1, such a self-limited growth of the CaF nanowire with a high aspect ratio becomes possible. (C) 2012 Elsevier B.V. All rights reserved.
引用
收藏
页码:1512 / 1519
页数:8
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