Quick Formation of DSA Neutralization Polymer Layer Attached by Reactive Self-Assembled Monolayer

被引：3

作者：

Hieno, Atsushi ^{[1
]}

Hattori, Shigeki ^{[1
]}

Nakamura, Hiroko ^{[1
]}

Asakawa, Koji ^{[1
]}

Seino, Yuriko ^{[2
]}

Kanno, Masahiro ^{[2
]}

Azuma, Tsukasa ^{[2
]}

机构：

[1] Toshiba Co Ltd, Corp Res & Dev Ctr, Mat Organ Lab, Saiwai Ku, Kawasaki, Kanagawa 2128582, Japan

[2] Toshiba Co Ltd, Corp Res & Dev Ctr, Device Proc Dev Ctr, Isogo Ku, Yokohama, Kanagawa 2358522, Japan

来源：

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 2012年 / 25卷 / 01期

关键词：

Directed Self-Assembly; Block Copolymer; Neutralization Layer; Reactive Self-Assembled Monolayer; Quick Polymer Immobilization; RANDOM COPOLYMER BRUSHES; DENSITY MULTIPLICATION; THERMAL-ACTIVATION; BLOCK-COPOLYMERS; SOLID-SURFACES; FILMS; IMMOBILIZATION; AZIDE;

D O I：

10.2494/photopolymer.25.73

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

The Neutralization layer for Directed self-assembly (DSA) was quickly formed by using polystyrene-polymethylmethacrylate random copolymer (PS-r-PMMA) immobilized by two different kinds of reactive self-assembled monolayers (SAMs). Two different kinds of reactive SAMs, one was photo-reactive and the other was thermal reactive, were covalently bound to PS-r-PMMA by the photo exposure or thermal annealing, respectively. The surface energy for the neutralization layer was easily controlled by the composition ratio of PS-r-PMMA. The lamellar-forming PS-PMMA block copolymer was perpendicularly aligned on the neutralization layers.

引用

页码：73 / 76

页数：4

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