High-voltage SOI lateral MOSFET with a dual vertical field plate

被引:4
作者
Fan Jie [1 ]
Zhang Bo [1 ]
Luo Xiao-Rong [1 ]
Li Zhao-Ji [1 ]
机构
[1] Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Peoples R China
基金
中国国家自然科学基金;
关键词
breakdown voltage; specific on-resistance; vertical field plate; oxide trench; POWER MOSFET; TRENCH; TRANSISTOR;
D O I
10.1088/1674-1056/22/11/118502
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
A new silicon-on-insulator (SOI) power lateral MOSFET with a dual vertical field plate (VFP) in the oxide trench is proposed. The dual VFP modulates the distribution of the electric field in the drift region, which enhances the internal field of the drift region and increases the drift doping concentration of the drift region, resulting in remarkable improvements in breakdown voltage (BV) and specific on-resistance (R-on,R-sp). The mechanism of the VFP is analyzed and the characteristics of BV and R-on,R-sp are discussed. It is shown that the BV of the proposed device increases from 389 V of the conventional device to 589 V, and the R-on,R-sp decreases from 366 m Omega.cm(2) to 110 m Omega.cm(2).
引用
收藏
页数:6
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