Optical Transitions in Direct-Bandgap Ge1-xSnx Alloys

被引:84
作者
Stange, D. [1 ,2 ]
Wirths, S. [1 ,2 ]
den Driesch, N. von [1 ,2 ]
Mussler, G. [1 ,2 ]
Stoica, T. [1 ,2 ,3 ]
Ikonic, Z. [4 ]
Hartmann, J. M. [5 ,6 ]
Mantl, S. [1 ,2 ]
Gruetzmacher, D. [1 ,2 ]
Buca, D. [1 ,2 ]
机构
[1] Forschungszentrum Julich, PGI 9, D-52425 Julich, Germany
[2] Forschungszentrum Julich, JARA Fundamentals Future Informat Technol, D-52425 Julich, Germany
[3] Natl Inst Mat Phys, Bucharest 077125, Romania
[4] Univ Leeds, Sch Elect & Elect Engn, Inst Microwaves & Photon, Leeds LS2 9JT, W Yorkshire, England
[5] Univ Grenoble Alpes, F-38000 Grenoble, France
[6] CEA Grenoble, LETI, F-38054 Grenoble, France
关键词
direct bandgap; photoluminescence; germanium tin; group IV; compressive strain; GAP; SI; DEPENDENCE; SILICON;
D O I
10.1021/acsphotonics.5b00372
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
A comprehensive study of optical transitions in direct-bandgap Ge0.875Sn0.125 group IV alloys via photo-luminescence measurements as a function of temperature, compressive strain and excitation power is performed. The analysis of the integrated emission intensities reveals a strain-dependent indirect-to-direct bandgap transition, in good agreement with band structure calculations based on the 8-band k.p and deformation potential methods. We have observed and quantified Gamma valley-heavy hole and Gamma valley-light hole transitions at low pumping power and low temperatures in order to verify the splitting of the valence band due to strain. We will demonstrate that the intensity evolution of these transitions supports the conclusion about the fundamental direct bandgap in compressively strained GeSn alloys. The presented investigation, thus, demonstrates that direct-bandgap group IV alloys can be directly grown on Ge-buffered Si(001) substrates despite their residual compressive strain.
引用
收藏
页码:1539 / 1545
页数:7
相关论文
共 50 条
[31]   Control of strain relaxation behavior of Ge1-xSnx buffer layers [J].
Shimura, Yosuke ;
Takeuchi, Shotaro ;
Nakatsuka, Osamu ;
Sakai, Akira ;
Zaima, Shigeaki .
SOLID-STATE ELECTRONICS, 2011, 60 (01) :84-88
[32]   Strained Ge and Ge1-xSnx Technology for Future CMOS Devices [J].
Nakatsuka, Osamu ;
Takeuchi, Shotaro ;
Shimura, Yosuke ;
Sakai, Akira ;
Zaima, Shigeaki .
TECHNOLOGY EVOLUTION FOR SILICON NANO-ELECTRONICS, 2011, 470 :146-+
[33]   Impact of Temperature and Doping on the Performance of Ge/Ge1-xSnx/Ge Heterojunction Phototransistors [J].
Kumar, Harshvardhan ;
Basu, Rikmantra ;
Chang, Guo-En .
IEEE PHOTONICS JOURNAL, 2020, 12 (03)
[34]   Interplay of strain and intermixing effects on direct-bandgap optical transition in strained Ge-on-Si under thermal annealing [J].
Lee, Chulwon ;
Yoo, Yang-Seok ;
Ki, Bugeun ;
Jang, Min-Ho ;
Lim, Seung-Hyuk ;
Song, Hyun Gyu ;
Cho, Jong-Hoi ;
Oh, Jungwoo ;
Cho, Yong-Hoon .
SCIENTIFIC REPORTS, 2019, 9 (1)
[35]   Radiative carrier lifetime in Ge1-xSnx midinfrared emitters [J].
Daligou, Gerard ;
Attiaoui, Anis ;
Assali, Simone ;
Del Vecchio, Patrick ;
Moutanabbir, Oussama .
PHYSICAL REVIEW APPLIED, 2023, 20 (06)
[36]   Thermoelectric power factor of Ge1-xSnx thin films [J].
Portavoce, A. ;
Khelidj, H. ;
Oueldna, N. ;
Amhil, S. ;
Bertoglio, M. ;
Mangelinck, D. ;
Essaleh, L. ;
Hoummada, K. .
MATERIALIA, 2020, 14
[37]   Electronic and spectral properties of Ge1-xSnx quantum dots [J].
Gawarecki, Krzysztof ;
Ziembicki, Jakub ;
Scharoch, Pawel ;
Kudrawiec, Robert .
JOURNAL OF APPLIED PHYSICS, 2024, 135 (21)
[38]   Electro-Optical Characterization of an Amorphous Germanium-Tin (Ge1-XSnx) Microbolometer [J].
Esam Bahaidra ;
Najeeb Al-Khalli ;
Mahmoud Hezam ;
Mohammad Alduraibi ;
Bouraoui Ilahi ;
Nacer Debbar ;
Mohamed Abdel-Rahman .
Journal of Infrared, Millimeter, and Terahertz Waves, 2023, 44 :233-244
[39]   Temperature dependence of energy gap of Ge1-xSnx alloys with x < 0.11 studied by photoreflectance [J].
Zelazna, K. ;
Welna, M. ;
Misiewicz, J. ;
Dekoster, J. ;
Kudrawiec, R. .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2016, 49 (23)
[40]   Strained Pseudomorphic Ge1-xSnx Multiple Quantum Well Microdisk Using SiNy Stressor Layer [J].
Fenrich, Colleen S. ;
Chen, Xiaochi ;
Chen, Robert ;
Huang, Yi-Chiau ;
Chung, Hua ;
Kao, Ming-Yen ;
Huo, Yijie ;
Kamins, Theodore I. ;
Harris, James S. .
ACS PHOTONICS, 2016, 3 (12) :2231-2236