Mo/Si Multilayer Mirrors with B4C and Be Barrier Layers

被引：4

作者：

Zuyev, S. Yu ^{[1
]}

Pariev, D. E. ^{[1
]}

Pleshkov, R. S. ^{[1
]}

Polkovnikov, V. N. ^{[1
]}

Salashchenko, N. N. ^{[1
]}

Svechnikov, M., V ^{[1
]}

Sertsu, M. G. ^{[1
]}

Sokolov, A. ^{[1
]}

Chkhalo, N., I ^{[1
]}

Schafers, F. ^{[1
]}

机构：

[1] Russian Acad Sci, Inst Phys Microstruct, Nizhnii Novgorod 603087, Russia

来源：

JOURNAL OF SURFACE INVESTIGATION | 2019年 / 13卷 / 02期

基金：

俄罗斯科学基金会; 俄罗斯基础研究基金会;

关键词：

X-ray radiation; multilayer mirrors; magnetron sputtering; X-RAY REFLECTIVITY; EXTREME-ULTRAVIOLET; TECHNOLOGY;

D O I：

10.1134/S1027451019020216

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

Conventional Mo/Si mirrors and mirrors with B4C and Be barrier layers, designed for reflection at wavelengths around 13.5 nm, are fabricated using magnetron sputtering and studied. Their reflectance is measured at different grazing angles and at different wavelengths. Four-component multilayer mirrors of the Mo/Be/Si/B4C type are shown to surpass, in terms of the reflection coefficient, their Mo/Si and Mo/Si/B4C counterparts by 2 and 1%, respectively, at wavelengths of incident radiation of 12.4, 12.7, 13.0, and 13.5 nm.

引用

页码：169 / 172

页数：4