Plasma source development for the NDCX-I and NDCX-II neutralized drift compression experiments

被引:6
作者
Gilson, E. P. [1 ]
Davidson, R. C. [1 ]
Efthimion, P. C. [1 ]
Gleizer, J. Z. [2 ]
Kaganovich, I. D. [1 ]
Krasik, Ya. E. [2 ]
机构
[1] Princeton Univ, Plasma Phys Lab, Princeton, NJ 08543 USA
[2] Technion Israel Inst Technol, Dept Phys, IL-32000 Haifa, Israel
基金
美国国家科学基金会;
关键词
Accelerators; Heavy ion fusion; Ion beams; Plasma sources;
D O I
10.1017/S0263034612000328
中图分类号
O59 [应用物理学];
学科分类号
摘要
Compressed ion beams are being studied as a driver for inertial confinement fusion energy and for the creation of matter in the high-energy-density regime. In order to facilitate compression of a positive ion charge bunch longitudinally and transversely beyond the limit determined by the space-charge field of the bunch, a source of charge-neutralizing electrons must be provided. Plasma sources have been developed for the NDCX-I and NDCX-II experimental facilities, both for the 2-m-long, field-free drift regions, and for the small-diameter interior of the multi-Tesla final focus solenoid. Barium titanate based cylinders with a high dielectric coefficient are used to line the wall of the 2-m-long drift region and by applying a 9 kV pulse between the inner and outer surfaces of the cylinders, plasma with a density in the 10(10) cm(-3) range is formed. Results are presented from experiments using this plasma source on NDCX-I. A compact plasma source 5.1 cm long and 3.8 cm in diameter, also made using the barium titanate based material, has been developed for use in the bore of the final focus solenoid. Plasma generated near the wall of the plasma source will follow the fringing magnetic field lines of the solenoid and help to fill the bore of the magnet with plasma. Improved designs for the barium titanate plasma sources are being considered that use different inner-surface electrode materials and structures, and also use a modified electrical driver employing a spark gap crowbar switch. In addition, plasma source designs using so-called flashboard technology have been developed. In the flashboard plasma source, high density plasma is formed when the applied high voltage pulse causes a series of breakdowns between isolated copper patches aligned in rows along the surface of the 0.2 mm thick flashboard.
引用
收藏
页码:435 / 443
页数:9
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