共 50 条
- [3] Effects of SF6 addition to O2 plasma on polyimide etching JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2000, 39 (12B): : 7011 - 7014
- [6] Study on plasma etching of β-SiC thin films in SF6 and the SF6 + O2 mixtures Wuli Xuebao, 3 (554-555):
- [8] Effects of SF6 addition to O2 plasma on polyimide etching in ECR plasma etcher MICROPROCESSES AND NANOTECHNOLOGY 2000, DIGEST OF PAPERS, 2000, : 214 - 215
- [9] USE OF A NEW GAS, SULFUR HEXAFLUORIDE, SF6, IN PNEUMOPERITONEUM - TREATMENT FOR TUBERCULOSIS AMERICAN REVIEW OF TUBERCULOSIS AND PULMONARY DISEASES, 1957, 76 (06): : 1063 - 1070
- [10] Etching of high aspect ratio features in Si using SF6/O2/HBr and SF6/O2/Cl2 plasma JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2005, 23 (06): : 1592 - 1597