Delocalized Oxygen as the Origin of Two-Level Defects in Josephson Junctions

被引:31
|
作者
DuBois, Timothy C. [1 ]
Per, Manolo C. [1 ,2 ]
Russo, Salvy P. [1 ]
Cole, Jared H. [1 ]
机构
[1] RMIT Univ, Sch Appl Sci, Melbourne, Vic 3001, Australia
[2] CSIRO Mat Sci & Engn, Virtual Nanosci Lab, Parkville, Vic 3052, Australia
关键词
D O I
10.1103/PhysRevLett.110.077002
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
One of the key problems facing superconducting qubits and other Josephson junction devices is the decohering effects of bistable material defects. Although a variety of phenomenological models exist, the true microscopic origin of these defects remains elusive. For the first time we show that these defects may arise from delocalization of the atomic position of the oxygen in the oxide forming the Josephson junction barrier. Using a microscopic model, we compute experimentally observable parameters for phase qubits. Such defects are charge neutral but have nonzero response to both applied electric field and strain. This may explain the observed long coherence time of two-level defects in the presence of charge noise, while still coupling to the junction electric field and substrate phonons. DOI: 10.1103/PhysRevLett.110.077002
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页数:5
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