Fabrication of photonic ring resonator device in silicon waveguide technology using soft UV-nanoimprint lithography

被引：13

作者：

Plachetka, U. ^{[1
]}

Koo, N. ^{[1
]}

Wahlbrink, T. ^{[1
]}

Bolten, J. ^{[1
]}

Waldow, M. ^{[2
]}

Ploetzing, T. ^{[2
]}

Foerst, M. ^{[2
]}

Kurz, H. ^{[1
]}

机构：

[1] AMICA, D-52074 Aachen, Germany

[2] Univ Aachen, RWTH Aachen, Inst Semicond Elect, D-52074 Aachen, Germany

来源：

IEEE PHOTONICS TECHNOLOGY LETTERS | 2008年 / 20卷 / 5-8期

关键词：

integrated optics; lithography; nanoimprint; photonics; resonator;

D O I：

10.1109/LPT.2008.918386

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We report on an innovative fabrication method for high-quality resonant photonic devices on silicon-on-insulator substrates with quality (Q)-factor of 47700 and propagation losses of 3.5 dB/cm. The definition of a resonator device using soft ultraviolet-nanoimprint lithography is detailed followed by description of an adapted structure transfer process. Spectral response measurements and propagation loss analysis were carried out evidencing the functionality of the fabricated resonator.

引用

收藏

页码：490 / 492

页数：3

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