Influence of thickness on the structural, optical and electrical properties of Ga-doped ZnO thin films deposited by sputtering magnetron

被引:41
作者
Mahdhi, H. [1 ]
Alaya, S. [1 ]
Gauffier, J. L. [2 ]
Djessas, K. [3 ]
Ben Ayadi, Z. [1 ]
机构
[1] Fac Sci Gabes, Lab Phys Mat & Nanomat Appl Environm LaPhyMNE, Erriadh Manara Zrig 6072, Gabes, Tunisia
[2] INSA Toulouse, Dept Phys, 135 Ave Rangueil, F-31077 Toulouse 4, France
[3] Univ Perpignan, Lab Proc Mat & Energie Solaire PROMES CNRS, Rambla Thermodynam, F-66100 Perpignan, France
关键词
Nanostructures; Sol-gel and magnetron sputtering; Film thickness; Electrical and optical properties; ZINC-OXIDE; TRANSPARENT; NANOPARTICLES; MICROSTRUCTURE; TEMPERATURE; DEPENDENCE; RAMAN; RF;
D O I
10.1016/j.jallcom.2016.11.117
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
In the present work, we have deposited Ga-doped ZnO (GZO) thin films by magnetron sputtering technique using nanocrystalline particles elaborated by sol-gel method as a target material. The effect of the thickness, on the physical properties of the GZO thin films was analyzed. The influence of the thickness, on structure, surface morphologies, chemical atomic composition, electrical and optical properties was investigated by XRD, SEM, TEM, AFM, Raman measurement, Hall measurement and UV Vis-NIR spectrophotometer, respectively. X-ray diffraction (XRD) results revealed the polycrystalline nature of the films with hexagonal wurtzite structure having preferential orientation a long [002] direction normal to the substrate. The lowest resistivity obtained from electrical studies was 10(-)4 ohm cm. The optical properties were studied using a UV-vis spectrophotometer and the average transmittance in the visible region (400-800 nm) was found to be 90%. (C) 2016 Elsevier B.V. All rights reserved.
引用
收藏
页码:697 / 703
页数:7
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