Optimization and experimentation of nanoimprint lithography based on FIB fabricated stamp

被引：27

作者：

Sun, HW ^{[1
]}

Liu, JQ ^{[1
]}

Chen, D ^{[1
]}

Gu, P ^{[1
]}

机构：

[1] Shanghai Jiao Tong Univ, Inst Micro & Nano Sci & Technol, Key Lab Thin Film & Micorfabricat, Minist Educ, Shanghai 200030, Peoples R China

来源：

MICROELECTRONIC ENGINEERING | 2005年 / 82卷 / 02期

关键词：

nanoimprint lithography; focused ion beam; parameter optimization; Taguchi method; orthogonal experiment;

D O I：

10.1016/j.mee.2005.07.008

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The maskless and resistless focused ion beam (FIB) fabrication approach to make imprint stamp is straightforward and rapid compared to the traditional electron beam method. FIB etched stamp consisting of grooves was employed to nanoimprint polymer mr-I 9020. Taguchi orthogonal experiment with four parameter elements, one at three levels was used to optimize the experiment parameters by the analysis of means and variances. The most significant factor influencing the height of replicated lines is imprint temperature and the optimal combination of the process parameters are the imprint temperature at 160 degrees C, imprint force at 1200 N, loading force velocity at 0.2 mm/min, and imprint time at 300s. (c) 2005 Elsevier B.V. All rights reserved.

引用

页码：175 / 179

页数：5

共 11 条

[1] IMPROVING THE QUALITY OF AN OPTIMAL POWER-FLOW SOLUTION BY TAGUCHI METHOD [J].