Production and application of reactive plasmas using helicon-wave discharge in very low magnetic fields

被引：9

作者：

Sato, G ^{[1
]}

Kato, T ^{[1
]}

Oohara, W ^{[1
]}

Hatakeyama, R ^{[1
]}

机构：

[1] Tohoku Univ, Dept Elect Engn, Sendai, Miyagi 9808579, Japan

来源：

THIN SOLID FILMS | 2006年 / 506卷

关键词：

helicon-wave discharge; plasma enhanced chemical vapor deposition; nanostructures; carbon;

D O I：

10.1016/j.tsf.2005.08.049

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

In order to explore new application fields of a helicon-wave discharge, we have investigated the production of helicon-wave plasmas in very low magnetic fields (0-10 mT) and the resultant nanocarbon creation using methane and/or hydrogen. The reactive plasmas are effectively produced by the helicon wave around 3 mT independently of gas species in the wide range of pressures (0.1 -10 Pa), where hydrocarbons and atomic hydrogens are generated. Using the helicon-wave reactive plasma as a precursor source for plasma-enhanced chemical vapor deposition, well-aligned carbon nanotubes and nanowalls are found to be formed even in a very low gas pressure of 0.7 Pa. (c) 2005 Elsevier B.V. All rights reserved.

引用

页码：550 / 554

页数：5

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