Production and application of reactive plasmas using helicon-wave discharge in very low magnetic fields

被引：9

作者：

Sato, G ^{[1
]}

Kato, T ^{[1
]}

Oohara, W ^{[1
]}

Hatakeyama, R ^{[1
]}

机构：

[1] Tohoku Univ, Dept Elect Engn, Sendai, Miyagi 9808579, Japan

来源：

THIN SOLID FILMS | 2006年 / 506卷

关键词：

helicon-wave discharge; plasma enhanced chemical vapor deposition; nanostructures; carbon;

D O I：

10.1016/j.tsf.2005.08.049

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

In order to explore new application fields of a helicon-wave discharge, we have investigated the production of helicon-wave plasmas in very low magnetic fields (0-10 mT) and the resultant nanocarbon creation using methane and/or hydrogen. The reactive plasmas are effectively produced by the helicon wave around 3 mT independently of gas species in the wide range of pressures (0.1 -10 Pa), where hydrocarbons and atomic hydrogens are generated. Using the helicon-wave reactive plasma as a precursor source for plasma-enhanced chemical vapor deposition, well-aligned carbon nanotubes and nanowalls are found to be formed even in a very low gas pressure of 0.7 Pa. (c) 2005 Elsevier B.V. All rights reserved.

引用

页码：550 / 554

页数：5

共 19 条

[1] Helicons - The early years [J].

Boswell, RW ;

Chen, FF .

IEEE TRANSACTIONS ON PLASMA SCIENCE, 1997, 25 (06) :1229-1244

[2] CHARACTERIZATION OF SILICON DIOXIDE FILMS DEPOSITED AT LOW-PRESSURE AND TEMPERATURE IN A HELICON DIFFUSION REACTOR [J].

CHARLES, C ;

GIROULTMATLAKOWSKI, G ;

BOSWELL, RW ;

GOULLET, A ;

TURBAN, G ;

CARDINAUD, C .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1993, 11 (06) :2954-2963

[3] Helicons - The past decade [J].

Chen, FF ;

Boswell, RW .

IEEE TRANSACTIONS ON PLASMA SCIENCE, 1997, 25 (06) :1245-1257

[4]

Endo K, 1996, APPL PHYS LETT, V68, P2864, DOI 10.1063/1.116350

[5] Effects of micro- and macro-plasma-sheath electric fields on carbon nanotube growth in a cross-field radio-frequency discharge [J].

Hatakeyama, R ;

Jeong, GH ;

Kato, T ;

Hirata, T .

JOURNAL OF APPLIED PHYSICS, 2004, 96 (11) :6053-6060

[6] Magnetron-type radio-frequency plasma control yielding vertically well-aligned carbon nanotube growth [J].

Hirata, T ;

Satake, N ;

Jeong, GH ;

Kato, T ;

Hatakeyama, R ;

Motomiya, K ;

Tohji, K .

APPLIED PHYSICS LETTERS, 2003, 83 (06) :1119-1121

[7] HELICAL MICROTUBULES OF GRAPHITIC CARBON [J].

IIJIMA, S .

NATURE, 1991, 354 (6348) :56-58

[8]

IKUNO T, 1996, JPN J APPL PHYS, P6717

[9] Synthesis of cubic boron nitride films using a helicon wave plasma and reduction of compressive stress [J].

Kim, IH ;

Kim, KS ;

Kim, SH ;

Lee, SR .

THIN SOLID FILMS, 1996, 290 :120-125

[10]

Kuttel OM, 1998, APPL PHYS LETT, V73, P2113, DOI 10.1063/1.122395

← 1 2 →