All-Graphene Planar Double Barrier Resonant Tunneling Diodes

被引:15
|
作者
Al-Dirini, Feras [1 ,2 ,3 ]
Hossain, Faruque M. [1 ,2 ]
Nirmalathas, Ampalavanapillai [1 ]
Skafidas, Efstratios [1 ,2 ]
机构
[1] Univ Melbourne, Dept Elect & Elect Engn, Parkville, Vic 3010, Australia
[2] Univ Melbourne, Ctr Neural Engn, Parkville, Vic 3010, Australia
[3] Natl ICT Australia, Victorian Res Lab, West Melbourne, Vic 3003, Australia
来源
IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY | 2014年 / 2卷 / 05期
关键词
Double barrier; extended Huckel; graphene; planar diode; resonant tunneling; rectifier; NDR; NEGF;
D O I
10.1109/JEDS.2014.2327375
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this work, we propose an atomically-thin all-graphene planar double barrier resonant tunneling diode that can be realized within a single graphene nanoribbon. The proposed device does not require any doping or external gating and can be fabricated using minimal process steps. The planar architecture of the device allows a simple in-plane connection of multiple devices in parallel without any extra processing steps during fabrication, enhancing the current driving capabilities of the device. Quantum mechanical simulation results, based on non-equilibrium Green's function formalism and the extended Huckel method, show promising device performance with a high reverse-to-forward current rectification ratio exceeding 50 000, and confirm the presence of negative differential resistance within the device's current-voltage characteristics.
引用
收藏
页码:118 / 122
页数:5
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