Effects of substrate temperature and ambient oxygen pressure on growth of Ba(Fe1/2Nb1/2)O3 thin films by pulsed laser deposition

被引：6

作者：

Zhang Wei ^{[1
]}

Wu ShuYa ^{[1
]}

Chen XiangMing ^{[1
]}

机构：

[1] Zhejiang Univ, Dept Mat Sci & Engn, Lab Dielect Mat, Hangzhou 310027, Zhejiang, Peoples R China

来源：

CHINESE SCIENCE BULLETIN | 2013年 / 58卷 / 27期

基金：

中国国家自然科学基金;

关键词：

Ba(Fe1/2Nb1/2)O-3; thin films; pulsed laser deposition; morphology; CACU3TI4O12;

D O I：

10.1007/s11434-013-5980-2

中图分类号：

O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];

学科分类号：

07 ; 0710 ; 09 ;

摘要：

Ba(Fe1/2Nb1/2)O-3 thin films were grown on Pt/TiO2/SiO2/Si substrates with pulsed laser deposition (PLD) at temperatures ranging from 823 to 923 K with the varied ambient oxygen pressure. X-ray diffraction (XRD) data confirmed the single phase of polycrystalline Ba(Fe1/2Nb1/2)O-3 thin films. The effects of substrate temperature and ambient oxygen pressure on the surface morphologies of the thin films were investigated by atomic force microscopy (AFM) and the growth dynamics of thin films was discussed. Larger grains and denser surface morphologies were observed with increasing substrate temperature. While finer grains were produced with increasing ambient oxygen pressure due to more frequent collisions between the ejected species and ambient oxygen molecules. The influence of the substrate temperature and ambient oxygen pressure on the dielectric properties was also discussed. Improved dielectric constant and decreased dielectric loss was observed for the thin film deposited at evaluated temperature.

引用

页码：3398 / 3402

页数：5

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