共 37 条
Blue photoluminescent Si nanocrystals prepared by high-current pulsed electron beam irradiation
被引:3
作者:

Lv, Peng
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机构:
Jiangsu Univ, Sch Mat Sci & Engn, Zhenjiang 212013, Peoples R China Jiangsu Univ, Sch Mat Sci & Engn, Zhenjiang 212013, Peoples R China

Zhang, Zaiqiang
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h-index: 0
机构:
Jiangsu Univ, Sch Mat Sci & Engn, Zhenjiang 212013, Peoples R China Jiangsu Univ, Sch Mat Sci & Engn, Zhenjiang 212013, Peoples R China

Wang, Xiaotong
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机构:
Jiangsu Univ, Sch Mat Sci & Engn, Zhenjiang 212013, Peoples R China Jiangsu Univ, Sch Mat Sci & Engn, Zhenjiang 212013, Peoples R China

Hou, Xiuli
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机构:
Jiangsu Univ, Sch Mat Sci & Engn, Zhenjiang 212013, Peoples R China Jiangsu Univ, Sch Mat Sci & Engn, Zhenjiang 212013, Peoples R China

Guan, Qingfeng
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机构:
Jiangsu Univ, Sch Mat Sci & Engn, Zhenjiang 212013, Peoples R China Jiangsu Univ, Sch Mat Sci & Engn, Zhenjiang 212013, Peoples R China
机构:
[1] Jiangsu Univ, Sch Mat Sci & Engn, Zhenjiang 212013, Peoples R China
来源:
关键词:
POROUS SILICON;
LIGHT EMISSION;
LUMINESCENCE;
SURFACE;
FABRICATION;
ORIGIN;
OXIDE;
DOTS;
D O I:
10.1039/c3ra43064b
中图分类号:
O6 [化学];
学科分类号:
0703 ;
摘要:
Si nanocrystals (Si-ncs) were prepared from n-type Si (100) wafers by using high-current pulsed electron beam irradiation in vacuum. High density (9.7 x 10(14) cm(-2)) ultrafine Si-ncs (similar to 3 nm) embedded in amorphous Si layers (similar to 60 nm) exhibit blue photoluminescence emission at room temperature which can be attributed to the quantum confinement size effect. The pulse number is a key parameter which influences the photoluminescence intensity. Possible formation mechanisms of Si-ncs are discussed.
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页码:17998 / 18001
页数:4
相关论文
共 37 条
[1]
Characterization of high-current electron beam interaction with metal targets
[J].
An, W.
;
Krasik, Ya E.
;
Fetzer, R.
;
Bazylev, B.
;
Mueller, G.
;
Weisenburger, A.
;
Bernshtam, V.
.
JOURNAL OF APPLIED PHYSICS,
2011, 110 (09)

An, W.
论文数: 0 引用数: 0
h-index: 0
机构:
Karlsruhe Inst Technol, D-76021 Karlsruhe, Germany Karlsruhe Inst Technol, D-76021 Karlsruhe, Germany

Krasik, Ya E.
论文数: 0 引用数: 0
h-index: 0
机构:
Karlsruhe Inst Technol, D-76021 Karlsruhe, Germany
Technion Israel Inst Technol, Dept Phys, IL-32000 Haifa, Israel Karlsruhe Inst Technol, D-76021 Karlsruhe, Germany

Fetzer, R.
论文数: 0 引用数: 0
h-index: 0
机构:
Karlsruhe Inst Technol, D-76021 Karlsruhe, Germany Karlsruhe Inst Technol, D-76021 Karlsruhe, Germany

Bazylev, B.
论文数: 0 引用数: 0
h-index: 0
机构:
Karlsruhe Inst Technol, D-76021 Karlsruhe, Germany Karlsruhe Inst Technol, D-76021 Karlsruhe, Germany

Mueller, G.
论文数: 0 引用数: 0
h-index: 0
机构:
Karlsruhe Inst Technol, D-76021 Karlsruhe, Germany Karlsruhe Inst Technol, D-76021 Karlsruhe, Germany

Weisenburger, A.
论文数: 0 引用数: 0
h-index: 0
机构:
Karlsruhe Inst Technol, D-76021 Karlsruhe, Germany Karlsruhe Inst Technol, D-76021 Karlsruhe, Germany

Bernshtam, V.
论文数: 0 引用数: 0
h-index: 0
机构:
Weizmann Inst Sci, IL-62100 Rehovot, Israel Karlsruhe Inst Technol, D-76021 Karlsruhe, Germany
[2]
Oxide and hydrogen capped ultrasmall blue luminescent Si nanoparticles
[J].
Belomoin, G
;
Therrien, J
;
Nayfeh, M
.
APPLIED PHYSICS LETTERS,
2000, 77 (06)
:779-781

Belomoin, G
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Illinois, Dept Phys, Urbana, IL 61801 USA Univ Illinois, Dept Phys, Urbana, IL 61801 USA

Therrien, J
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Illinois, Dept Phys, Urbana, IL 61801 USA Univ Illinois, Dept Phys, Urbana, IL 61801 USA

Nayfeh, M
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Illinois, Dept Phys, Urbana, IL 61801 USA Univ Illinois, Dept Phys, Urbana, IL 61801 USA
[3]
SILICON QUANTUM WIRE ARRAY FABRICATION BY ELECTROCHEMICAL AND CHEMICAL DISSOLUTION OF WAFERS
[J].
CANHAM, LT
.
APPLIED PHYSICS LETTERS,
1990, 57 (10)
:1046-1048

CANHAM, LT
论文数: 0 引用数: 0
h-index: 0
机构: Royal Signals and Radar Establishment, Worcestershire WR14 3PS, St. Andrews Road
[4]
The structural and luminescence properties of porous silicon
[J].
Cullis, AG
;
Canham, LT
;
Calcott, PDJ
.
JOURNAL OF APPLIED PHYSICS,
1997, 82 (03)
:909-965

Cullis, AG
论文数: 0 引用数: 0
h-index: 0
机构:
DEF RES AGCY, MALVERN WR14 3PS, WORCS, ENGLAND DEF RES AGCY, MALVERN WR14 3PS, WORCS, ENGLAND

Canham, LT
论文数: 0 引用数: 0
h-index: 0
机构:
DEF RES AGCY, MALVERN WR14 3PS, WORCS, ENGLAND DEF RES AGCY, MALVERN WR14 3PS, WORCS, ENGLAND

Calcott, PDJ
论文数: 0 引用数: 0
h-index: 0
机构:
DEF RES AGCY, MALVERN WR14 3PS, WORCS, ENGLAND DEF RES AGCY, MALVERN WR14 3PS, WORCS, ENGLAND
[5]
VISIBLE-LIGHT EMISSION DUE TO QUANTUM SIZE EFFECTS IN HIGHLY POROUS CRYSTALLINE SILICON
[J].
CULLIS, AG
;
CANHAM, LT
.
NATURE,
1991, 353 (6342)
:335-338

CULLIS, AG
论文数: 0 引用数: 0
h-index: 0
机构: DRA Electronics Division, Royal Signals and Radar Establishment, Malvern, Worcester WR14 3PS, St Andrews Road

CANHAM, LT
论文数: 0 引用数: 0
h-index: 0
机构: DRA Electronics Division, Royal Signals and Radar Establishment, Malvern, Worcester WR14 3PS, St Andrews Road
[6]
Formation of ordered nanoscale semiconductor dots by ion sputtering
[J].
Facsko, S
;
Dekorsy, T
;
Koerdt, C
;
Trappe, C
;
Kurz, H
;
Vogt, A
;
Hartnagel, HL
.
SCIENCE,
1999, 285 (5433)
:1551-1553

Facsko, S
论文数: 0 引用数: 0
h-index: 0
机构: Rhein Westfal TH Aachen, Inst Semicond Elect, D-52074 Aachen, Germany

Dekorsy, T
论文数: 0 引用数: 0
h-index: 0
机构: Rhein Westfal TH Aachen, Inst Semicond Elect, D-52074 Aachen, Germany

Koerdt, C
论文数: 0 引用数: 0
h-index: 0
机构: Rhein Westfal TH Aachen, Inst Semicond Elect, D-52074 Aachen, Germany

Trappe, C
论文数: 0 引用数: 0
h-index: 0
机构: Rhein Westfal TH Aachen, Inst Semicond Elect, D-52074 Aachen, Germany

Kurz, H
论文数: 0 引用数: 0
h-index: 0
机构: Rhein Westfal TH Aachen, Inst Semicond Elect, D-52074 Aachen, Germany

Vogt, A
论文数: 0 引用数: 0
h-index: 0
机构: Rhein Westfal TH Aachen, Inst Semicond Elect, D-52074 Aachen, Germany

Hartnagel, HL
论文数: 0 引用数: 0
h-index: 0
机构: Rhein Westfal TH Aachen, Inst Semicond Elect, D-52074 Aachen, Germany
[7]
Observation of persistent photoluminescence in porous silicon: Evidence of surface emission
[J].
Fan, JC
;
Chen, CH
;
Chen, YF
.
APPLIED PHYSICS LETTERS,
1998, 72 (13)
:1605-1607

Fan, JC
论文数: 0 引用数: 0
h-index: 0
机构:
Natl Taiwan Univ, Dept Phys, Taipei, Taiwan Natl Taiwan Univ, Dept Phys, Taipei, Taiwan

Chen, CH
论文数: 0 引用数: 0
h-index: 0
机构:
Natl Taiwan Univ, Dept Phys, Taipei, Taiwan Natl Taiwan Univ, Dept Phys, Taipei, Taiwan

Chen, YF
论文数: 0 引用数: 0
h-index: 0
机构:
Natl Taiwan Univ, Dept Phys, Taipei, Taiwan Natl Taiwan Univ, Dept Phys, Taipei, Taiwan
[8]
Order enhancement and coarsening of self-organized silicon nanodot patterns induced by ion-beam sputtering
[J].
Gago, R.
;
Vazquez, L.
;
Plantevin, O.
;
Metzger, T. H.
;
Munoz-Garcia, J.
;
Cuerno, R.
;
Castro, M.
.
APPLIED PHYSICS LETTERS,
2006, 89 (23)

Gago, R.
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Autonoma Madrid, Ctr Microanal Mat, E-28049 Madrid, Spain Univ Autonoma Madrid, Ctr Microanal Mat, E-28049 Madrid, Spain

Vazquez, L.
论文数: 0 引用数: 0
h-index: 0
机构: Univ Autonoma Madrid, Ctr Microanal Mat, E-28049 Madrid, Spain

Plantevin, O.
论文数: 0 引用数: 0
h-index: 0
机构: Univ Autonoma Madrid, Ctr Microanal Mat, E-28049 Madrid, Spain

Metzger, T. H.
论文数: 0 引用数: 0
h-index: 0
机构: Univ Autonoma Madrid, Ctr Microanal Mat, E-28049 Madrid, Spain

Munoz-Garcia, J.
论文数: 0 引用数: 0
h-index: 0
机构: Univ Autonoma Madrid, Ctr Microanal Mat, E-28049 Madrid, Spain

Cuerno, R.
论文数: 0 引用数: 0
h-index: 0
机构: Univ Autonoma Madrid, Ctr Microanal Mat, E-28049 Madrid, Spain

Castro, M.
论文数: 0 引用数: 0
h-index: 0
机构: Univ Autonoma Madrid, Ctr Microanal Mat, E-28049 Madrid, Spain
[9]
Surface modification of TC4 titanium alloy by high current pulsed electron beam (HCPEB) with different pulsed energy densities
[J].
Gao, Yu-kui
.
JOURNAL OF ALLOYS AND COMPOUNDS,
2013, 572
:180-185

Gao, Yu-kui
论文数: 0 引用数: 0
h-index: 0
机构:
Tongji Univ, Coll Aerosp Engn & Appl Mech, Shanghai 200092, Peoples R China Tongji Univ, Coll Aerosp Engn & Appl Mech, Shanghai 200092, Peoples R China
[10]
Surface nanostructure and amorphous state of a low carbon steel induced by high-current pulsed electron beam
[J].
Guan, QF
;
Zou, H
;
Zou, GT
;
Wu, AM
;
Hao, SZ
;
Zou, JX
;
Qin, Y
;
Dong, C
;
Zhang, QY
.
SURFACE & COATINGS TECHNOLOGY,
2005, 196 (1-3)
:145-149

Guan, QF
论文数: 0 引用数: 0
h-index: 0
机构: Dalian Univ Technol, State Key Lab Mat Modificat, Dalian 116024, Peoples R China

Zou, H
论文数: 0 引用数: 0
h-index: 0
机构: Dalian Univ Technol, State Key Lab Mat Modificat, Dalian 116024, Peoples R China

Zou, GT
论文数: 0 引用数: 0
h-index: 0
机构: Dalian Univ Technol, State Key Lab Mat Modificat, Dalian 116024, Peoples R China

Wu, AM
论文数: 0 引用数: 0
h-index: 0
机构: Dalian Univ Technol, State Key Lab Mat Modificat, Dalian 116024, Peoples R China

Hao, SZ
论文数: 0 引用数: 0
h-index: 0
机构: Dalian Univ Technol, State Key Lab Mat Modificat, Dalian 116024, Peoples R China

Zou, JX
论文数: 0 引用数: 0
h-index: 0
机构: Dalian Univ Technol, State Key Lab Mat Modificat, Dalian 116024, Peoples R China

Qin, Y
论文数: 0 引用数: 0
h-index: 0
机构: Dalian Univ Technol, State Key Lab Mat Modificat, Dalian 116024, Peoples R China

Dong, C
论文数: 0 引用数: 0
h-index: 0
机构: Dalian Univ Technol, State Key Lab Mat Modificat, Dalian 116024, Peoples R China

Zhang, QY
论文数: 0 引用数: 0
h-index: 0
机构:
Dalian Univ Technol, State Key Lab Mat Modificat, Dalian 116024, Peoples R China Dalian Univ Technol, State Key Lab Mat Modificat, Dalian 116024, Peoples R China