Stochastic model applied to plasma-surface interaction's simulation

被引:9
作者
Bondareva, AL [1 ]
Zmievskaya, GI [1 ]
Levchenko, VD [1 ]
机构
[1] MV Keldysh Appl Math Inst, Moscow 125047, Russia
关键词
D O I
10.1140/epjd/e2006-00044-0
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
The kinetic approach of the nonequilibrium distribution functions (contrasted with the both sizes and coordinates) were calculated for liquid thin film islands as well as for gaseous-vacancy defects into lattice (blisters). The model based on Ito-Stratonovich stochastic differential equations solution, was applied to the defects migration and to defects fluctuation stage of cluster formation. The material porosity and lattice strain values were estimated. Computer simulation results such as surface damaging, the structural and phase alternation of state surface transformation can be compared with experiments of impact powerful pulse plasma fluxes of nano- and micro-second duration ionizing radiation.
引用
收藏
页码:143 / 149
页数:7
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