Oxidation of low-index FeAl surfaces

被引:73
作者
Graupner, H
Hammer, L
Heinz, K
Zehner, DM
机构
[1] UNIV ERLANGEN NURNBERG,LEHRSTUHL FESTKORPERPHYS,D-91058 ERLANGEN,GERMANY
[2] OAK RIDGE NATL LAB,DIV SOLID STATE,OAK RIDGE,TN 37831
关键词
aluminum; iron; low energy electron diffraction; low index single crystal surfaces; oxidation; x-ray photoelectron spectroscopy;
D O I
10.1016/S0039-6028(96)01594-4
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The oxidation of the (100), (110) and (111) surfaces of the intermetallic compound FeAl has been investigated using LEED and XPS. On all three surfaces, oxidation at room temperature leads to the formation of an amorphous oxide film on top of an Al-depleted interlayer. The him growth can be divided into two regions of differing kinetics, i.e. the initial formation of a closed oxide film and a subsequent thickening In the first region, the oxygen-uptake rate varies significantly with surface orientation, while in the thickening regime the uptake is the same for all surfaces. The maximum thickness as well as the composition of the oxide films were found to depend on the initial oxidation rate. At higher oxidation temperatures, ordered oxide films of around 5-8 Angstrom in thickness are formed, very similar to those observed on NiAl. Photoemission spectra from these ordered phases showed evidence for Al atoms in two different chemical environments, i.e. the well-known oxide species in the interior of the film and an additional species present at the oxide/alloy interface. (C) 1997 Elsevier Science B.V.
引用
收藏
页码:335 / 351
页数:17
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