A compact and polarization-insensitive silicon waveguide crossing based on subwavelength grating MMI couplers

被引：37

作者：

Wu, Sailong ^{[1
]}

Mao, Simei ^{[1
]}

Zhou, Lidan ^{[2
]}

Liu, Lin ^{[2
]}

Chen, Yujie ^{[2
]}

Mu, Xin ^{[1
]}

Cheng, Lirong ^{[1
]}

Chen, Zhenmin ^{[1
]}

Tu, Xin ^{[3
]}

Fu, H. Y. ^{[1
]}

机构：

[1] Tsinghua Univ, Tsinghua Berkeley Shenzhen Inst, Shenzhen 518055, Peoples R China

[2] Sun Yat Sen Univ, Sch Elect & Informat Technol, State Key Lab Optoelect Mat & Technol, Guangzhou 510275, Peoples R China

[3] China Univ Geosci, Sch Mech Engn & Elect Informat, Wuhan 430074, Peoples R China

来源：

OPTICS EXPRESS | 2020年 / 28卷 / 19期

关键词：

PRINCIPLES;

D O I：

10.1364/OE.399568

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

In this work, we proposed and experimentally demonstrated a compact and low polarization-dependent silicon waveguide crossing based on subwavelength grating multimode interference couplers. The subwavelength grating structure decreases the effective refractive index difference and shrinks the device footprint. Our designed device is fabricated on the 220-nm SOI platform and performs well. The measured crossing is characterized with low insertion loss (< 1 dB), low polarization-dependence loss (< 0.6dB), and low crosstalk (< -35 dB) for both TE and TM polarizations with a compact footprint of 12.5 mu m x 12.5 mu m. (C) 2020 Optical Society of America under the terms of the OSA Open Access Publishing Agreement

引用

页码：27268 / 27276

页数：9

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